Ferroelectric behavior of bismuth titanate thin films grown via magnetron sputtering
Reactive Ion Beams Sputtering of Vanadium Oxides Films for Uncooled Microbolometer
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REACTIVE ION BEAMS SPUTTERING OF VANADIUM OXIDES FILMS FOR UNCOOLED MICROBOLOMETER Hongchen Wang, 1 Xinjian Yi, 1,2 Sihai Chen, 1 Shaowei He, 1 Xiaochao Fu 1 1 Department of Optoelectronic Engineer, Huazhong University of Science & Technology, Wuhan 430074, China 2 State Key Laboratory for Laser Technology, Huazhong University of Science & Technology, Wuhan 430074, China Tel.: +86-27-66284621; Fax: +86-27-87542087; E-mail address: [email protected] 15 November 2004 International Journal of Infrared and Millimeter Waves, Vol. 26, No. 3, March 2005 (© 2005) DOI: 10.1007/s10762-005-3439-5 421 0195-9271/05/0300-0421/0 © 2005 Springer Science+Business Media, Inc.
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Transcript of Reactive Ion Beams Sputtering of Vanadium Oxides Films for Uncooled Microbolometer
REACTIVE ION BEAMS SPUTTERING OF VANADIUM OXIDESFILMS FOR UNCOOLED MICROBOLOMETER
Hongchen Wang,1 Xinjian Yi,1,2 Sihai Chen,1 Shaowei He,1
Xiaochao Fu1
1Department of Optoelectronic Engineer,Huazhong University of Science & Technology,
Wuhan 430074, China2State Key Laboratory for Laser Technology,
Huazhong University of Science & Technology,Wuhan 430074, China
Tel.: +86-27-66284621; Fax: +86-27-87542087;E-mail address: [email protected]
15 November 2004
International Journal of Infrared and Millimeter Waves, Vol. 26, No. 3, March 2005 (© 2005)DOI: 10.1007/s10762-005-3439-5
421
0195-9271/05/0300-0421/0 © 2005 Springer Science+Business Media, Inc.