REACTIVE ION BEAMS SPUTTERING OF VANADIUM OXIDESFILMS FOR UNCOOLED MICROBOLOMETER
Hongchen Wang,1 Xinjian Yi,1,2 Sihai Chen,1 Shaowei He,1
Xiaochao Fu1
1Department of Optoelectronic Engineer,Huazhong University of Science & Technology,
Wuhan 430074, China2State Key Laboratory for Laser Technology,
Huazhong University of Science & Technology,Wuhan 430074, China
Tel.: +86-27-66284621; Fax: +86-27-87542087;E-mail address: [email protected]
15 November 2004
International Journal of Infrared and Millimeter Waves, Vol. 26, No. 3, March 2005 (© 2005)DOI: 10.1007/s10762-005-3439-5
421
0195-9271/05/0300-0421/0 © 2005 Springer Science+Business Media, Inc.
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