Diagnostic of Output Radiation of Capillary ... - EUV Litho, Inc.

Electron impact type laboratory EUV source for metrology and imaging

Ladislav Pina1,2, Alexandr Jancarek1

1Czech Technical University, Prague, 2Rigaku Innovative Technologies Europe, Prague

2018 Source Workshop, Prague, November 05-07, 2018

Czech Technical University in Prague

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What energies are we looking for?

Soft X-ray: 200eV – 2000eV X-ray: 2 keV – 50 keV

2 2018 Source Workshop, Prague, November 05-07, 2018

Introduction

DPP and LPP sources for metrology and imaging • Pulsed Energy • Repetition rate • Lifetime • Lasing, coherence • Focusibility – source size, system geometry • Optics • Compactness • Cost


outer nozzle

inner nozzle

high-Z gas (xenon, krypton, argon)

low-Z gas (helium,

hydrogen) laser

beam

electromagnetic valve system X-ray backlighting images

H. Fiedorowicz et al. Appl.Phys. B 70 (2000) 305; Patent No.: US 6,469,310 B1

Laser Produced Plasma – gas puff target

Laboratory EUV source No 1 - LPP


LMI

Nd:YAG beam

EUV source

Double stream valve system

Mo/Si ellipsoidal mirror

Image of the source

Taken from report titled ”Opracowanie projektu układu optycznego do formowania wiązki promieniowania laserowo - plazmowego źródła EUV Nr 451/WAT/2001 (SPUB-M)”

EUV condenser - geometry

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2018 Source Workshop, Prague, November 05-07, 2018

LMI

6 1mm

-30 mm -28 mm -26 mm -24 mm -22 mm

-20 mm -18 mm -16 mm -14 mm -12 mm

-10 mm -8 mm -6 mm -4 mm -2 mm

0 mm +2 mm +4mm +6 mm +8 mm

P43 scintillator From Proxitronic Thickness: 4 microns

Scheme of the EUV microscope condenser alignment

Series of images of the spatial distribution of radiation focused by the condenser in the proximity of the condenser focal plane. The distances show displacement of the measurement plane from the optimal in-focus position at z= 0 mm

Condenser alignment and resolution measurement


Z-pinching Capillary Discharge

Introduction

• Radial compression of plasma by Lorenz force

• Plasma heating

• Fast cooling of plasma due adiabatic expansion

• Preionisation for discharge stabilisation P. Vrba, M. Vrbová, N. A. Bobrova, and P. V. Sasorov, “Modelling of a nitrogen X-ray laser pumped by capillary discharge,” Cent. Eur. J. Phys., vol. 3, no. 4, pp. 564–580, 2005

Laboratory EUV source No 2 – DPP

Capillary discharge source


Main discharge unit

• Ceramic Capacitors (1.25 ÷ 31 nF).

• Al2O3 capillary, 3.2mm dia., 20cm long.

• Low inductance -> high dI/dt.

• Pulse-charged: 1x Marx + coil.

• Rogowski coil.

CTU Prague, Fac. of Nucl. Sci

CAPILLARY DISCHARGE APPARATUS FOR INTENSE EUV RADIATION GENERATION

DPP source at CTU


Focal spot image

(λ=2.88 nm)

DPP source and condenser metrology (images of focused beam)

M. Fahad Nawaz, A. Jancarek, M. Nevrkla, P. Wachulak, J. Limpouch, L. Pina, “ Focusing and photon flux measurements of the 2.88 nm

radiation at the sample plane of the soft X-ray microscope, based on capillary discharge source”, in Proc SPIE 2015,p. Art No. 951014.


Micromirror ML mirror Polycapillary

Steering & focusing coils

Electron Gun X-ray beam Target

• The focus may be changed from spot to line electronically

• Stability of focal spot assured

• Modular design allows ease of access for tube changes

• Patents

• Focal spot size, shape and position are controlled automatically

MicroSOURCE® X-ray source – X-ray mirror combination


Ellipsoidal X-ray Mirror

2018 Source Workshop, Prague, November 05-07, 2018 11

Ellipsoidal X-ray Mirror (X-ray beam images)


Replicated GI Mirrors Geometry and size

Example: Ellipsoidal mirror • Mirror surface has shape of

rotational ellipsoid • Source is placed in left focus • Detector or sample is placed in

right focus • Radiation strikes mirror surface

at grazing angles 0,5° ÷ 20° • Mirror is focusing radiation from

left focus on right focus

EUV/XUV Beam Focusing


e-beam

optics

Large anode X-ray tube

(lower complexity, lower cost, higher reliability, higher power)

Microfocus X-ray tube

(high complexity, high cost, low power)

Anode Anode

Small focus Large focus


Electron tube

1. e-source

2. Anode - target

3. X-ray optic

4. X-ray focus

3D X-ray source & 3D X-ray mirror combination

PATENT PENDING

(higher power , small X-ray focal spot, lower complexity, higher reliability)

Rotationally symmetric X-ray mirror


Computer simulation

Z1 = 5 mm Z1 = 250 mm

Grazing incidence angle distribution

(disk target)


Focal intensity distribution

(disk target, Z1 = 5 mm)

Computer simulation




Computer simulation


Summary

3D X-ray source & 3D X-ray mirror combination for metrology and imaging

• Electron tube • Rotationally symmetric X-ray optic • CW or pulsed operation • mm X-ray focal spot size • Power • Compactness • Stability


THANK YOU FOR ATTENTION

Prague


Diagnostic of Output Radiation of Capillary ... - EUV Litho, Inc.

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