Pergamon

ERRATUM

Acta mater. Vol. 45, No.2, pp. 889-896, 1997 Published by Elsevier Science Ltd

Printed in Great Britain

W. Hu. W. Wunderlich and G. Gottstein, Acta mater. Vol. 44, No.6, pp. 2383-2396 (1996)

Interfacial chemical stability during diffusion bonding of AbOrfibers with Ni3Al and NiAl matrices

The publisher regrets that the TEM-micrographs were printed erroneously without labelling the constituents. This makes it virtually impossible to understand the micrographs. Therefore, in the following the correctly labelled micrographs are presented.

Fig.2. Bright field HRTEM images showing interface structure of a specimen with Ni 3AI-matrix. (a) Amorphous thin film; (b) nanocrystalline and nanoamorphous areas, as indicated by arrows. Hot

pressing condition: l280Cj20 MPa/2 h, in cacuum.

889

890 Erratum

8 a-AI 203: 91:(0,2,1)/g2:(0,1,7) zone=[2,-1,0]

o NiaAl: 91:(1,0,0)/g2:(0,1,2) zone=[ 1,1,2]

II1II o-AI203: 91:(3,1,4)/92:(3,-1,-8) zone=[ -2,18, -3]

Fig. 3. Bright field TEM micrograph of a needle shaped interface reaction product. (a) The SAD patterns were taken from a similar location: (b) in the interfacial area and (c) calculated patterns of interfacial area.

Erratum 891

• a-AI203: 91 :(0, 1,2)/g2:(-1, 1,-2) z=[ -4,-2,1]

o Ni3Al: 91:(2,0,1)/92:(1,2,-1) z= [2,1,4]

III (M9,Ni)AI204: 91:(1,1,1)/92:(4,2,-2) z=[ -2,3,-1]

Fig. 4. Trigonal-shaped interface precipitate. (a) Bright field TEM micrograph and EDS analysis; (b) SAD-pattern of interfacial area; (c) calculated pattern of the interfacial area.

892 Erratum

Fig. 5. Bright field HRTEM mcirograph in the interfacial area between trigonal shaped (Mg,Ni)Ab)4 shown in Fig. 4(a) and its adjacent a-Ab03 grain. Orientation relation: (0,1,2), AI2oj/(l,1,1)(Mg.N;jAI20, and

[-4, - 2, Ij,oAl2oj I[ - 2,3, -lj(Mg.Ni)AI20,

Erratum

Fig. 7. Bright field HRTEM micrographs of specimens with NiAI-matrix hot pressed in vacuum. (a) Diffusion bonded at 1400c C and 5 MPa for 2 h; (b) diffusion bonded at 1450°C and 5 MPa for 2 h.

893

894 Erratum

o Ni: 91:(2,2,O)/g2:(l,-l,3) ZDI1e"[3,-3,-2]

l1li NiAI204: 91:(4,2,2)/g2:(2,2,-4) zone=[3,5,1]

Fig. 8 (a). Caption on page 895.

Erratum

Fig. 8 (b-d).

• NiO: 91:(3,1,3)/92:(0,6,-2) zone=[ -3,1,3]

IlII NiAI204: 91:(4,0,0)/g2:(0,4,0) zone=[0,0,1]

Fig. 8. Interfacial morphology of a specimen with Ni1AI-matrix diffusion bonded in air. Hot pressing parameters: 1280°C/20 Mpaj2 h. (a) Bright field TEM micrograph; (b) bright field HRTEM micrograph; (c) SAD-pattern measured and recalculated for particle A shown in (a) and Table 2; (d) SAD-pattern

measured and recalculated for particle B shown in (a) and Table 2.

895

896 Erratum

Fig. 10. Interfacial morphology of specimen with NiAI-matrix hot pressed in air at 1400°C and 7 MPa for 2 h. (a) Bright field TEM micrograph; and (b) bright field HRTEM

micrograph.