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A Novel Interconnect Design with High Stretchability and Fine Pitch
Capability for Applications in Stretchable Electronics
Yung-Yu Hsu1, 2, Mario Gonzalez1, Frederick Bossuyt3, Fabrice Axisa3, Jan
Vanfleteren3, and Ingrid De Wolf1, 2
1IMEC-IPSI, Kapeldreef 75, 3001, Leuven, Belgium
2Department of Materials Engineering, K.U. Leuven, Belgium
3IMEC-CMST, Gent-Zwijnaarde, Belgium
Abstract
In this paper, the electromechanical properties of a new design for metal
interconnection in stretchable electronics are reported. In this design, a patterned
metal interconnect with a zigzag shape is adhered on an elastomeric substrate. The
electrical resistance remains constant until metal breakdown at elongations beyond
40%. There is no significant local necking in either the transverse or the thickness
direction at the metal breakdown area as shown by both scanning electron microscopy
micrographs and resistance measurements. Micrographs and simulation results show
that a debonding occurs due to the local twisting of a metal interconnect, out-of-plane
peeling and strain localized at the crest of a zigzag structure.
Keywords: stretchable interconnect; debonding; twisting; patterned metal film;
polymer substrate
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1. Introduction
Large area deformable macroelectronics, such as flexible display [1], electronic
skin [2], electronic textile [3], etc., have to withstand various modes of deformation
(e.g., bending, twisting and stretching). Such electronic systems usually are composed
of inorganic parts with limited deformability, and organic parts which can sustain
large deformations. Because of the elastic nature of elastomers, these materials are
often used as substrates for the specific applications mentioned above. In order to
fulfill the demand of deformability, many concepts have been developed. One of these
concepts consists of small rigid islands with active devices or individual thin chips
which are interconnected by thin metal conductor lines. All rigid components are
placed on the small islands to ensure that the strains acting on these brittle
components are small when the structure is subjected to a large deformation. Since the
thin conductor lines have to withstand all these deformations, a proper structural
design is necessary to avoid losing structural integrity and electrical functionality
during this deformation.
Several technologies have been proposed in recent years, such as in-plane
patterned metal conductors [4,5,6], out-of-plane wrinkling metal films [7,8], and
conductive polymers or liquid alloys [9,10]. It has been reported that by depositing a
thin metal strip with a thickness of few nanometers on an elastomeric substrate, the
elongation of the metal can go up to 50% while the strip remains conductive [11].
Upon large strain, the elastic deformation of the elastomeric substrate causes local
debondings of the metal film coevolving with strain localizations [12,13,14,15,
16,17,18,19]. Thanks to this coevolved process, even a ‘straight’ line, deposited on a
polymer substrate, is stretchable. However, a drawback of this unique characteristic is
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that the resistance of the thin metal film changes with elongation, which might be a
disadvantage for certain applications. Another approach for having a stable resistance
is to use bulk metal conductors. Compared to a freestanding bulk metal straight line
which ruptures at strains of 1%~2% [20], an in-plane patterned horseshoe metal
conductor can be stretched up to 100% with a stable resistance before electrical
failure [21,22].
This paper demonstrates a novel in-plane patterned zigzag structure, with
resistance independent of elongation before metal rupture, which can be stretched
beyond 40%. The advantage compared to the horseshoe [21,22], is that due to the
geometrical design, the in-plane zigzag structural interconnects can be applied in a
fine pitch microelectronic device, as shown in figure 1. The experimental
observations on local twisting of the zigzag structure and delamination at the interface
after stretching are discussed and experimental results are supported by numerical
explanations.
2. Finite element modeling
Figure 2 (a) illustrates the design of the patterned zigzag metal conductor
adhering on an elastomeric substrate. Because of the repetition of the zigzag structure,
only the first five crests are shown in this figure. By taking advantage of the
symmetric geometry, half of the zigzag structure was modeled by finite element
simulations. The angle of each crest of the patterned zigzag metal conductor is 60
degree, 3 mm in amplitude. The width and the thickness of the metal track are
0.1 mm and 0.018 mm, respectively. The substrate is a 10 mm × 25 mm × 0.5 mm
block. The uniaxial elongation μ is applied on the end surfaces of the substrate as the
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boundary condition, which corresponds to the experiment. For the convenience of
future analysis, each crest of the zigzag structures is marked (positions A to F),
corresponding with stress and strain concentration points. Out-of-plane deformation
and average equivalent plastic strain will be extracted and analyzed from these points
of the model. The commercial finite element code, MSC.MARC®, was used to
simulate the deformation process of the patterned metal on an elastomeric substrate.
The metal used in this research is copper and is modeled as a plastically deformable
solid, obeying the bi-linear kinematic hardening rule, with the elastic Young’s
Module 0E =117000 MPa, the yielding point at yσ =172.3 MPa, and the Tangent
Module tE =1034.2 MPa. The elastomeric substrate is modeled as an incompressible
hyperelastic Neo-Hookean solid [23] with C10=0.157.
3. Sample preparation
Poly-dimethyl siloxane (PDMS) (Sylgard 186®, Dow Corning) was chosen as
the elastomeric substrate, carrying a patterned metal on top of it. In order to achieve a
stable resistance, low cost and large area fabricating capability, a stand-alone copper
foil with 0.018 mm in thickness was not fabricated in house (which can be done by
sputtering, electroplating, or evaporating copper), but purchased from a printed circuit
board vendor. In order to improve the weak adhesion between the organic and the
inorganic interface, a potassium monopersulfate solution was used for microetching
the copper surface. After microetching, the surface of the copper foil was 2 µm in
roughness as measured by a WYKO interferometer. The prepared copper foil was
then temporarily adhered on a Teflon mold, which is 0.5 mm in thickness. The Teflon
mold has an opening window which is used for casting the PDMS on top of the
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copper foil. The PDMS was prepared in a 10:1 weight ratio of the polymer base and
curing agent at room temperature. After degassing of the air bubbles, the PDMS was
poured in the Teflon window and cured at 60ºC for 12 hours. The conventional
photolithography and wet etching processes were then employed after the Cu/PDMS
lamination was released from the Teflon mold. The Cu/PDMS lamination was cut into
10 mm× 70 mm stripes and two connecting wires were soldered on each pad for
electrical measurements, as shown in figure 2 (b). The distance between the two pads
in free-standing condition was 50 mm (without applied strain).
4. Experimental Setup
The electromechanical properties of the zigzag interconnect on the elastomeric
substrate were evaluated by stretching the substrate on a custom made tensile tester
(Fig. 3). All tests were performed at room temperature and at a constant strain rate of
4 12.5 10 s− −× . During tensile testing, the electrical resistance of the patterned metal
interconnect was recorded in-situ by an Agilent 34420A multimeter. Each data point
of electrical resistance was recorded every 1/3s. The four points probing technique
was employed in the testing so that the resistance of the connecting wires can be
neglected. By this technique, only the resistance of the patterned zigzag interconnect
was measured. The surface morphologies of the fully unloaded specimens were
characterized using a JEOL 5600LV scanning electron microscope (SEM).
5. Result and Discussion
5.1 Electrical resistance under mechanical deformation
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Figure 4 shows that the resistance is independent of the applied uniaxial strain.
The specimen was subjected to a one-time stretching and the experiment was
terminated when the electrical circuit failed at an elongation of 43%. The initial
resistance was Rinitial = 1.06 Ω when the sample was in the relaxed state. During the
tensile test and before the metal break, the electrical resistance remained constant
within a ±2% oscillation. The oscillation is caused by noise originating in the
measurement system. At 43% elongation, there was an abrupt break of the conductor
line resulting in a sudden infinite increase of the resistance (open circuit). The
resistance remained unchanged up to that large elongation because the patterned
zigzag conductor mainly deforms due to opening of the zigzag structure (geometrical
deformation, i.e. opening of the crest), and not due to metal strain (elongation of the
Cu line). The electrical circuit failed due to a metal break at the first crest (position B,
see inset in Fig. 4), although interfacial debonding combined with local twisting was
also observed at other crests. This failure at position B can be explained by the
geometrical non-symmetry and discontinuity of this first crest.
5.2 Local twisting and out-of-plane deformation caused debonding
Figure 5 shows the simulated equivalent plastic strain εpl of the zigzag structure
at 40% elongation. In order to compare the local strain at different crests, the
normalized average equivalent plastic strain, calculated from these simulations, is
plotted in Figure 6(a) at the different crest positions (A to F, see Fig. 2a). When the
zigzag structure is subjected to μ=40% elongation, position B has the highest local
plastic strain. This can be explained by the fact that B has an asymmetrical geometry,
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with one short and one long arm. Also A has an unsymmetrical geometry, however
the change of the angle between the arms upon elongation is smaller in A than in B.
For this reason A has a lower equivalent plastic strain than B, nevertheless, higher
than C, D etc. Figure 6 (b) shows the deformed zigzag interconnect during stretching.
Both simulation and experimental results show that position B has a larger
geometrical opening than the other positions which results in the highest local plastic
strain and explains why the Cu line fails first in position B (see Fig. 4, inset). The
plastic strain reaches a constant value starting from position F because of the stable
internal stress/strain distribution.
The local plastic strain at each crest is not only caused by the geometrical
opening of the arms, but also by local twisting and out-of-plane deformation during
the stretching. Indeed, upon deformation the inner, concave side of the crest tends to
move downwards, pushing the substrate locally down; while the outer, convex side of
the crest moves upwards, pulling the substrate up. As a result, the Cu line is not lying
flat anymore but is locally tilted (twisting). The forces acting on the substrate can
plastically deform the substrate at the inside (pushed down), while they can result in
delamination of the Cu from the substrate at the outer side (peeling-off). Figure 6 (c)
shows the simulation results of the normalized out-of-plane deformation at the outer
side of the crests. Since the metal is adhered to the substrate, the out-of-plane
deformation is confined as long as debonding does not take place, and thus in-plane
opening dominated the deformation.
Figure 7 shows a scanning electron microscopy (SEM) micrograph taken at
position A (see Fig. 2a) on the relaxed sample after the tests shown in Fig. 4, i.e. after
detecting the open circuit. It clearly shows a local cohesive debonding at position A,
but the Cu line is still intact. This debonding is caused, as explained above, by the
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local out-of-plane deformation and twisting. Some PDMS at the debond region is still
adhered to the Cu, indicating that the PDMS is locally tearing. This is because the
adhesion strength between copper and PDMS is larger than the strength of the PDMS.
The rough porous looking surface of the PDMS substrate is caused by the surface
roughness of the copper foil since the PDMS was casted on the copper surface. The
rough copper surface enhances the interfacial adhesion, and thus the crack went
through the porous region of the PDMS substrate because of its weak structural
integrity.
On the inner edge of the crest at position A, due to the local twisting
deformation, the copper interconnect compressed the PDMS substrate. The Cu was
plastically deformed and as such did not return back to its original geometry.
Figure 8 (a) and (b) show a set of SEM micrographs taken with different tilted
angles of position B. At this position, there is not only twisting, delamination and
plastic deformation of the Cu, in addition the metal broke and caused the electric
circuit failure. Not only the Cu cracks, there is also a crack in the PDMS at the same
position. No significant necking was observed at the cross-section of the metal rupture
area. When the specimen is being stretched to a large deformation, the crack of the
copper interconnect near the crest probably initiated and propagated too fast without
allowing large plastic necking. This phenomenon can also be attested by the
resistance measurements. If there were plastic necking during stretching, the
resistance would increase substantially before failure instead of remaining constant.
From the observation of micrographs and from simulation results, it is found
that the local twisting coevolved with the out-of-plane deformation at all the arms and
the crests. Figure 9 illustrates the typical deformation of the arms and the crest on a
side view (30o tilted) SEM micrograph of position C. The twisting arms caused local
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debonding from the substrate in one edge and compression on the PDMS substrate in
the other. The crest was peeled off from the substrate due to out-of-plane deformation.
It should be noted that, although there are local debonding and out-of-plane
deformation, no local necking or crack was observed at position C and beyond.
6. Conclusions
In summary, a zigzag shape patterned copper interconnect, with fine pitch
capability, supported by an elastomeric polymer substrate was fabricated by using a
large area and low cost process. Our experiments show that, with a proper patterned
structure design of the metal interconnect such as this zigzag structure, the metal
interconnect can deform without rupture when subject to large uniaxial tensile strain:
The electrical resistance of the interconnect remains constant up to a strain level of
43%, upon which the electric circuit fails due to breaking of the Cu in crest B. Both
the experimental and simulation results indicated that out-of-plane deformation on the
crests and local twisting coevolved. Although there was a debonding between the
metal and polymer substrate, local plastic necking of the metal interconnect was not
observed.
It is shown that this zig-zag design offers promising possibilities for stretchable
interconnects, especially for fine pitch applications. We demonstrated by FEM
simulations, by experiments and by SEM inspection that the weak point is clearly at
crest B. Therefore, by optimizing the design at that position using FEM, it is expected
that we can further improve the stretchability of this zigzag Cu interconnect structure.
Acknowledgements
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This work was supported by European Commission, under the research project
of STELLA (Contract Number 028026). The authors would like to thank Frederic
Duflos and Veerle Simons for their support of equipment setup and experiment.
References
1. G. P. Crawford: Flexible flat panel display. John Willey & Sons, Ltd., 2005.
2. V. J. Lumelsky, M. S. Shur, S. Wagner: Sensitive skin. IEEE J. Sensors, 1, 41,
(2001).
3. S. Wagner, E. Bonderover, W. B. Jordan, J. C. Sturm: Electrotextiles: Concepts
and Challenges. Int. J. High Speed Elec. Syst., 12, 1, (2002).
4. D. S. Gray, J. Tien, C. S. Chen: High-conductive elastomeric electronics. Adv.
Mater. 16, 5, 393-397, (2004).
5. D. Brosteaux, F. Axisa, M. Gonzalez, J. Vanfleteren: Design and fabrication of
elastic interconnections for stretchable electronic circuits. IEEE Electron Device
Lett., 28, 7, 552-554, (2007).
6. T. Li, Z. Suo, S. P. Lacour, S. Wagner: Compliant thin film patterns of stiff
materials as platforms for stretchable electronics. J. Mater. Res., 20, 12, 3274-
3277, (2005).
7. H. Mei, R. Huang, J. Y. Chung, C. M. Stafford, H. H. Yu: Buckling modes of
elastic thin films on elastic substrates. Appl. Phys. Lett. 90, 151902, (2007).
8. S. P. Lacour, S. Wagner, Z. Huang, Z. Suo: Stretchable gold conductrs on
elastomeric substrates. Appl. Phys. Lett. 82, 15, 2404-2406, (2003).
11
9. S. D. Deshpande, J. Kim, S.-R. Yun: Studies on conducting polymer electroactive
paper actuators: effect of humidity and electrode thickness. Smart Mater. Struct.,
14, 876-880, (2005).
10. H. J. Kim, C. Son, B. Ziaie : Amultiaxial stretchable interconnect using liquid-
alloy-filled elastomeric microchannels. Appl. Phys. Lett. 92, 011904, (2008).
11. N. Lu, X. Wang, Z. Suo, J. Vlassak: Metal films on polymer substrates stretched
beyond 50%. Appl. Phys. Lett. 91, 221909, (2007).
12. S. Wagner, S. P. Lacour, J. Jones, P. I. Hsu, J. C. Sturm, T. Li, Z. Suo : Electronic
skin : architecture and components. Phys. E. 25, 326-334, (2004).
13. S. P. Lacour, J. Jones, S. Wagner, T. Li, Z. Suo: Stretchable interconnects for
elastic electronic surfaces. Proc. of IEEE, 93, 8, 14591467, (2005).
14. T. Li, Z. Huang, Z. Suo, S. P. Lacour, S. Wagner: Stretchability of thin metal
films on elastomer substrates. Appl. Phys. Lett. 85, 16, 3435-3437, (2004).
15. Y. Xiang, T. Li, Z. Suo, J. Vlassak: High ductility of a metal film adherent on a
polymer substrate. Appl. Phys. Lett. 87, 161910, (2005).
16. T. Li, Z. Y. Huang, Z. C. Xi, S. P. Lacour, S. Wagner, Z. Suo: Delocalizing strain
in a thin metal film on a polymer substrate. Mech. Mat. 37, 261-273 (2006).
17. S. P. Lacour, Z. Hang, Z. Suo, S. Wagner: Deformable interconnects for
conformal integrated circuits. Mat. Res. Symp. Proc., 736, (2003).
18. J. Jones, S. P. Lacour, S. Wagner, Z. Suo: A method for making elastic metal
interconnects. Mat. Res. Symp. Proc., 769, (2003).
19. C. Chambers, S. P. Lacour, S. Wagner, Z. Suo, Z. Huang: Super-elastic gold
conductor on elastomeric substrates. Mat. Res. Symp. Proc., 769, (2003).
20. S. L. Chiu, J. Leu, P. S. Ho: Fracture of metal-polymer line structures. I:
Semiflexible polyimide. J. Appl. Phys., 76, 9, 5136-5142, (1994).
12
21. M. Gonzalez, F. Axisa, M. Vanden Bulcke, D. Brosteaux, B. Vandevelde, J.
Vanfleteren: Design of metal interconnects for stretchable electronic circuits.
Microelectronics Reliability 48, 825–832, (2008).
22. F. Axisa, D. Brosteaux, E. De Leersnyder, F. Bossuyt, M. Gonzalez, M. Vanden
Bulcke, J. Vanfleteren: Elastic and conformable electronic circuits and assemblies
using MID in polymer”, Proc. of IEEE Polytronic, 280-286, (2007).
23. MSC Marc® User Manual.
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Figure 1. Schematic of the pitch comparison between zigzag and horseshoe
interconnects; “d1“denotes to the pitch of zigzag interconnect and “d2” denotes the
pitch of horseshoes. Obviously, “d1” is smaller than “d2”.
d1
d2
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(a)
(b)
Figure 2. (a) Schematic of the geometrical design of the zigzag structure on an
elastomeric substrate which is subject to uniaxial elongation. Only five crests are
shown here because of repetition. (b) A freestanding specimen with connecting wires
soldered on each pad for electrical measurements.
A
B C
D E
F
μ
Pad
Elastomeric substrateUniaxial elongation
16
0 10 20 30 40 50 600.9
1.0
1.1
1.2
1.3
1.4
1.5
Res
ista
nce(Ω)
Uni-axial Strain (%)
Infinite Resistance
Figure 4. Electrical resistance of the Cu zigzag connector as a function of the applied
uniaxial tensile strain. The connector fails (open) at 43% strain.
metal break
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Figure 5. Three dimensional finite element model before and after deformation. The equivalent plastic strain distribution is visualized on the Cu line only.
Pad
A
B
C
D
E
F
Stretching Direction
A
B C
D
18
A B C D E F0.0
0.5
1.0
1.5
2.0
Nor
mal
ized
Ave
rage
Equ
ival
ent P
last
ic S
train
Position (a)
(b)
A B C D E F0
1
2
3
4
5
Nor
mal
ized
Out
of P
lane
Def
orm
atio
n
Position (c)
Figure 6. (a) Column graph of normalized average equivalent plastic strain at crests A
to F (see 2a) at 40% elongation. The results are obtained by finite element simulations.
(b) The deformed zigzag interconnect when subjected to stretching. (c) Column graph
of normalized out-of-plane deformation at crests A to F when at 40% elongation.
A B
C
D
E
F
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Figure 7. Relaxed state of Cu interconnect at position A after stretching up to 43%
strain. The top edge Cu compresses the PDMS substrate and the bottom edge peels
from the PDMS substrate. The narrow part of Cu is not necking but twisting. The
micrograph is taken with the sample tilted at 30º.
compressing
Position A
peeling
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(b)
Figure 8. SEM pictures taken at different angles of the broken Cu interconnect at
position B (see Fig. 2) after 43% strain (see Fig. 4). (a) Cu is broken and the PDMS
shows caving at the same location. Transverse necking in width is not pronounced.
The crest is debonded and deformed out-of-plane. (b) Broken Cu interconnect with
debonding and twisting. The inner radius part of the crest is pushing into the PDMS
substrate.
(a)
metal twisting
Position B
Position B
substrate caving
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Figure 9. A typical deformation pattern of a zigzag crest at position C (see Fig. 2)
after 43% uniaxial strain. The arms are twisting with one side debonding and another
side pushing down the PDMS substrate. The top of the crest is peeling off from the
PDMS substrate and deforming out-of-plane.
Position C