ENOVIA MatrixOne 10.8 accelerates innovation by enabling ...

At a glance

ENOVIA MatrixOne 10.8 solutions for Product Lifecycle Management(PLM) provide intellectual property (IP) modeling and collaborativebusiness processes based on a single service oriented architecture(SOA). From the conception of the new product, right through todelivery, ENOVIA MatrixOne 10.8 provides the following value:

• Transforming the value chain into a virtual enterprise

• Implementing standards-based solutions built to support global,enterprise-wide deployments

• Managing globally dispersed programs, project teams and connectedactivities

• Optimizing industry best practices and process excellence

• Connecting global engineering teams to enterprise businessprocesses

• Driving multidiscipline engineering processes including mechanical,electrical, semiconductor, embedded software, and artwork designdata

Overview

ENOVIA MatrixOne 10.8 offers customers greater flexibility andscalability along with multiple enhancements for existing ENOVIAMatrixOne 10.7.1 customers. ENOVIA MatrixOne 10.8 is available toexisting customers as a standard upgrade, and is the gateway toDassault Systemes' V6 PLM platform.

• The ENOVIA Collaboration Platform provides a seamlessenvironment for managing product innovation across the extendedenterprise with a set of collaborative business process and designdata management products. For companies that need to deploy pilotsfor small technical workgroups, the ENOVIA Collaboration PlatformWorkgroup Architecture is introduced. This product pre-configures theENOVIA Collaboration Platform so it can be deployed with a low-costdatabase and application server with minimal IT support.

• ENOVIA Program Central extends its leadership in managingcomplex multi-site, cross-functional programs by allowing theschedules of different projects to be cross-referenced in order to getreal-time program status while still allowing focused teams tosecurely manage their development tasks. In addition, fullconfigurability for ENOVIA Program Central is provided so companiescan manage their programs and projects to meet their uniquebusiness needs.

• ENOVIA industry solutions for apparel and medical device addressnew business processes. The ENOVIA Medical Device Acceleratorfor Regulatory Compliance now enables manufacturers to reduce

IBM United States Announcement208-110, dated April 29, 2008

ENOVIA MatrixOne 10.8 accelerates innovation by enablingcollaboration throughout complex business and engineeringprocesses

IBM United States Announcement 208-110 IBM is a registered trademark of International Business Machines Corporation 1

Description .................................................3

Product positioning .................................... 4

Reference information ............................... 9

Additional details ........................................9

Technical information ...............................32

Ordering information ................................40

Terms and conditions .............................. 47

Supplemental terms .................................48

Prices .......................................................51

product liability suits and improve product safety by identifying device hazards early in design.The ENOVIA Apparel Accelerator for Design and Development provides greater visibility tobill-of-material (BOM) changes to avoid decisions being made from outdated information andenhanced line planning capabilities to leverage non-seasonal library components whileadhering to business objectives of a specific season.

• ENOVIA support for Dassault Systemes 3DLive solution has been enhanced to includenavigation of CAD model structures from Pro/ENGINEER, UGS NX and Inventor in addition toexisting support for CATIA V5 and SolidWorks.

• ENOVIA's IP Modeling data management capabilities are expanded to include support forartwork designs created with Adobe Illustrator.

Key prerequisites

ENOVIA MatrixOne 10.8 runs on selected versions of:

• Microsoft® Windows®

• AIX®

• Hewlett Packard HP-UX

• Sun Solaris

• Red Hat Enterprise Linux™

• Macintosh

Planned availability date

May 2, 2008, ENOVIA MatrixOne 10.8 Program Suite


Description

ENOVIA MatrixOne 10.8 offers flexibility and scalability to accelerate product innovation acrossthe enterprise and engineering processes, across multiple industries. By adopting an ENOVIAenterprise-wide PLM solution, companies can to improve quality and the rate of innovation.

Implement standards-based solutions built to support global, enterprise-wide deployments —The ENOVIA Collaboration Platform is an open, standards-based product built to support global,enterprise-wide deployments and is equipped with the industry's highest level of flexibility,scalability and performance, making it the ideal platform to support the product developmentprocess of any enterprise in any industry. ENOVIA MatrixOne provides flexible and scalableproducts based on open standards and includes industry-specific capabilities to cover everyaspect of new product development including product planning, design and complex engineeringprocesses, materials compliance, product sourcing and program management.

The ENOVIA Collaboration Platform includes dynamic and flexible schema and built in modelingtools that enable organizations to quickly configure applications without expensive, timeconsuming coding. It is the underlying support for all of the ENOVIA MatrixOne products andprovides a seamless interface to Dassault Systemes comprehensive family of PLM solutions,which include CATIA, DELMIA, SIMULIA, and 3DLive.

Essential to any successful PLM initiative is the ability to interoperate with existing internalsystems and applications — as well as global partners and suppliers. ENOVIA MatrixOne can beinstalled on a single server providing worldwide access and offering the user's one consistentview of product development data. Through this unique and open architecture, ENOVIAMatrixOne products can be deployed and supported from a central location, while the file serverscan be distributed and controlled around the world to deliver the expected performance. Otherexternal systems that ENOVIA MatrixOne can be integrated to include Enterprise ResourcePlanning (ERP) applications, such as JD Edwards, SAP, Oracle, and QAD applications.

ENOVIA MatrixOne products are fully integrated with common end-user tools to speedcollaboration by enabling users to store and share data using their native business and designapplications; including Microsoft Word, Excel, PowerPoint, Outlook, Project, and Windows


Explorer. Product design and engineer teams can effectively collaborate with support for mostavailable Mechanical Computer Aided Design (MCAD) and Electronic Computer Aided Design(ECAD) tools. Teams that produce artwork as part of the design process can create, store andshare content using Adobe Illustrator.

Optimize industry best practices and process excellence — Industry-specific technologyspeeds deployment and user adoption. ENOVIA MatrixOne covers a broad variety of industriesand are designed to fully leverage proven business process applications that are tuned torepresent industry best practices, specific industry language and terminology, data models andschema, and pre-defined work processes and reports.

ENOVIA MatrixOne products help global enterprises bring together people, processes, content,and systems to achieve a compelling competitive advantage. Interoperable solutions unify andstreamline processes across the product life cycle, enabling companies to easily andcost-effectively work on projects within and outside of their enterprises. The adaptable andscalable technology is built to accommodate the ever-changing marketplace at the lowest totalcost of ownership. Incorporating the proven best practices of some of the world's most innovativecompanies, ENOVIA MatrixOne 10.8 addresses all stages of the product development cycleacross a broad range of industries to meet the needs of small scale teams and extendedenterprises with thousands of users who manage simple as well as highly engineered complexproducts.

Enterprises across all industries are embracing global outsourcing as a powerful means for costreduction, efficiency, and profitability. This model, however, is only as good as the platform thatsupports it. In order to realize these benefits, a company's PLM strategy must be supported by aproven platform capable of scaling to support the largest, most complex deployments andflexible enough to work in a variety of environments and quickly respond to change. It must alsoprovide the high performance necessary to allow the adoption of business process best practicesacross the global enterprise and throughout its value chain of customers, suppliers, andpartners.

The ENOVIA MatrixOne environment is organized by "domains", which represent a logicalgrouping of products based on the challenges that they are intended to address. All productsacross these domains are built with the same compatible technology and can be deployedtogether as part of a single ENOVIA MatrixOne system. Here are the ENOVIA MatrixOnedomains:

• PLM Enterprise Foundation — These products establish the necessary environment forrunning ENOVIA MatrixOne solutions for PLM. They include tools for administering the systemand integrations that can be applied to all other available product domains.

• IP Modeling — IP Modeling Design Data Management — These products providecross-functional, CAD design collaboration and tool integration. Integration to most MCAD andECAD applications are available.

• Collaborative Business Processes (CBP)

– CBP Compliancy Management — These products provide capabilities to manage productcompliance to government regulations currently focused on materials compliancy.

– CBP Program and Portfolio Management — These products provide capabilities to managethe product portfolio and execute new product introduction (NPI) development programs todeliver the products to market.

– CBP Enterprise Sourcing — These products extend the product development process tothe supply chain.

– CBP X-BOM Management — These products provide cross-functional BOM managementand change control capabilities.

– CBP Industry — These products extend offerings from the process domains withindustry-specific terminology, data types, and functions.

Accessibility by people with disabilities

Owing to the graphics-intensive nature of its engineering design applications, this product hasbeen granted a deviation.

Product positioning

Industry strengths


ENOVIA MatrixOne 10.8 offers applications that cover a broad process footprint ranging fromproduct definition to manufacturing handoff and enablement. From the conception of the newproduct, right through to delivery, ENOVIA MatrixOne 10.8 offers applications designed toaddress the demands of these role-based knowledge workers in the organization.

• Foster innovation through global teaming and workspaces

• Manage globally dispersed programs, project teams, and connected activities

• Provide global access to document storage and retrieval

• Maximize development efficiencies through interoperable processes that spanconcept-to-retirement

• Include validated industry best practices and process excellence

• Include role-based functionality for best fit and process

• Promote process expertise across multiple companies and geographies

• Transform the value chain into a virtual enterprise

Automotive industry

The globalization trend forcing asset reallocation, increased competition, high material costs, andincreased governmental, regional, and industry regulations are all pressures confronting theautomotive industry. These challenges, along with increased responsibility shifting down to thesupply chain tiers, add to the complexity of managing automotive vehicle programs to budgetand schedule. Consequently, automotive original equipment manufacturers (OEM) and suppliersneed to be flexible and flawlessly execute when managing global vehicle product programs.

To address the competitive pressures of the automotive industry, ENOVIA products deliver thefollowing value:

• Manage all aspects of automotive design ranging from the mechanical body-in-white andpower train, electronic wire harness, and embedded software controls.

• Capture customer and market needs to drive new product configurations and designs whilestill controlling product diversity and costs.

• Help manufacturers streamline execution and eliminate the manual administrative drain ofmanaging documents from the entire Advanced Program Quality Planning (APQP) process,while adhering to Automotive Industry Action Group (AIAG) standards

• Improve quality in less time, at a lower cost, and with fewer resources required to manage thenew product development process

• Help OEMs and their suppliers to deliver products to market more efficiently with:

– Decreased design change costs as a result of failure mode and effects analysis (FMEAs)that identify issues early in the development cycle when they are less expensive toovercome

– Enhanced product quality through improved communication between cross-functionalteams and suppliers and simplified tracking of Production Part Approval Process (PPAP)submission deliverables

– On-time, on-budget product launches due to enhanced management dashboard visibilityand risk mitigation for new vehicle programs from concept to launch

– Management of the direct material sourcing process concurrently with product design toensure bids are based on the latest designs and supplier input can positively impact costsand capabilities

• Ensure that products can be sold in worldwide markets through compliance with theEnd-of-Life Vehicle (ELV) material content regulations

Aerospace and defense (A&D) industry

Successful execution of an aerospace and defense program means managing volumes ofinformation to efficiently meet all contractual obligations. Tracking, reporting, and communicatingthat information involves teams of people across multiple functions and organizations. A solutionis required that integrates all of the critical data and program information into one consistentwhole.


To address the complexity of the aerospace and defense industry, ENOVIA products deliver thefollowing value:

• Aggregate all design aspects of an aerospace product in a single BOM that containselectronic, embedded software and mechanical items.

• Effectively outsource sub-systems through an electronic request-for-quote process that canalign procurement activities with the overall program execution.

• Improve communication across the entire program team, including external partners andoff-site locations.

• Earn award fees for their enterprise with improved contract data performance records.

• Improve customer satisfaction through on-time and Data Item Description (DID) compliantdeliveries of contract data.

• Penalties and late payments can be reduced with an integrated system to manage contractschedules and deliverables.

• Failed audits can be eliminated with a repeatable and secure submittal process.

• Submittal effort and cost can be reduced for data managers because documents and contractinformation can be consolidated into a single environment.

• Documentation rework for document authors can be reduced with more effective reviews andelectronic sign-off procedures.

Consumer packaged goods

Consumer packaged goods (CPG) companies often must adhere to specific compliance rules formanufacturing, especially when selling regulated products. If a product is designed andmanufactured without authorized and approved product specifications, there is significantcost/risk involved in either shutting down manufacturing lines or in the case of defective product,huge legal liability for damages. Under regulatory guidelines, products cannot be manufacturedwithout proper product specifications.

In order to help CPG companies comply with quality and regulatory guidelines across worldwidebrands, ENOVIA products deliver the following value:

• Expedite the procurement of raw materials with up-to-date specifications and the ability todefine products with the same product components to leverage buying power to reduce costs

• Allow effective specification management to also form the basis for BOM definition and feeddownstream supply chain processes that would integrate into raw material procurementprocesses

• Optimize resources across multiple product launches gives development teamscross-functional project visibility

• Reduce the number of regulated systems by removing isolated documents/data systems usedfor product development with a single, global, and validated process-driven system of record

• Increase product quality by enforcing brand definitions, logos, marketing standards, andmessaging utilizing flexible workflow and planning templates visible to all product/project teammembers

• Increase product pipeline volume by delivering product information to enable reuse indeveloping product variants rapidly

Footwear and apparel industry

The footwear and apparel industry is facing a new set of business challenges that are forcingcompanies to focus on product development improvements in order to respond more rapidly tomarket trends and changing customer needs. These challenges include increased globalcompetition, the need to target new markets and create new revenue streams, customerdemands for more innovative products, and pressures to reduce new product developmentcosts.

In order to help footwear and apparel companies address these challenges, ENOVIA productsdeliver the following value:

• Improve ability to capture and align industry trends, new product features and requirementswith after-market performance data to support seasonal line planning decisions


• Align and coordinate design, procurement and suppliers early in the design process toaccelerate sampling and placement decisions

• Increase time to market by standardizing product development procedures across theenterprise, manage hit ratios, and control development

• Establish and enforce corporate calendars and common measures for product developmentmilestones and performance (for example, sample, adoption, and component ratios)

• Reduce cycle time related to product development calendars, material trends, cost, andquality decisions

• Enable low-cost labor centers by creating a global virtual work teams tracking all line planningcalendars, milestones, approvals, and responsibilities in a single system integrated with allother aspects of product development

• Maximize intellectual assets internally and externally, from innovation to production, through acollaboration network

• Create an information infrastructure that automates and integrates product data, businessprocesses, and development workflows across the product life cycle

Hi-tech industry

The development process for hi-tech continues to grow in complexity, requiring shorterdevelopment cycles to achieve market goals for new products. Increased interaction ofmechanical, electrical, and software development has placed rising demands on selecting,qualifying, and testing parts for new designs. In addition, the needs for an electronic part and amechanical part, for example, are completely different, and new part requirements can differbased on division, location, or product line. Therefore, the part development processes forhi-tech companies require interaction and approvals by cross-functional users with different skillssuch as product design, testing, manufacturing, purchasing, and quality. This creates manyissues in coordinating the complex workflows, tasks, and deliverables required for efficient partqualification and development.

In order to help hi-tech companies address these challenges, ENOVIA products deliver thefollowing value:

• Manage the design and development of complex products (electronics, mechanical, andsoftware) to ensure products meet requirements the first time

• Realize the benefits of total participation by all players along the value chain and throughoutthe product life cycle

• Make design changes earlier in the product life cycle, when they can avoid 90% of the costsincurred by shop-floor engineering change orders

• Increase the value of designs and parts by making them easier to find and reuse

• Prevent schedule slippages that can develop into staggering cost overruns and market-sharelosses

• Produce more designs and respond better and faster to customer demands

• Give companies the power to handle the short product delivery cycles common to the industry

• Ensure that products can be sold in worldwide markets through compliance with the Reductionof Hazardous Substances (RoHS) material content regulations

Industrial industry

Innovation is one of the most important drivers for industrial equipment manufacturers. The needof innovation is not limited to engineering and product development, but it has to be extended toproduction and after-market services to bring more value. Companies are aggressively takingmeasures to drive down costs, shorten time from quote to delivery, close collaboration withsuppliers, access foreign markets, and find ways to stay close to customers. ENOVIA productsenable industrial equipment manufacturers to continue to operate in this global networkingmodel. ENOVIA products support leading-edge business processes, enable innovation, andboost customer/supplier collaboration.

In order to help industrial companies address these challenges, ENOVIA products deliver thefollowing value:


• Increase responsiveness to customer requirements by capturing the needs of the customerand quickly identifying the impact of any changes to downstream design, manufacturing, andsupplier chain business processes

• Improve overall process efficiency by integrating product development business processesbetween engineering, manufacturing, and the supply chain when working with a singlebill-of-material referencing product and non-product data

• Enable design for supply and supply for design in the enterprise by managing supplierinformation and communications with an electronic request for quote process and supplierprofile management

• Enable global collaboration with internal teams, customers, suppliers, and off-site teams tomeet deadlines and improve efficiency

• Reduce or eliminate the need for prototypes with digital mock-up for rapid testing andvalidation

Life sciences industry

Due to the complexities of medical devices, life sciences companies must incorporate a broaderarray of contributors and stakeholders located throughout the world into their design processes.At the same time, regulations from government bodies such as the United States Food and DrugAdministration (FDA) require companies to manage vast amounts of data and documents underformal and repeatable change control processes. Most importantly, medical device companiesmust constantly produce new and innovative products faster than before while containing costsin an ever-shifting marketplace.

In order to help life sciences companies address these challenges, ENOVIA products deliver thefollowing value:

• Help take cost out of processes across the organization via automation, streamlining andsynchronized communication

• Consolidate supply base and develop strategic suppliers and partners

• Emphasize process definition by improving common enterprise processes, and then track andmeasure those processes as a basis for improvement

• Adopt quality and regulatory methodologies (Six-Sigma, ISO, and FDA) and best-practices(CMII) for critical processes

• Focus on improving the program/project estimates, throughput, striking under-performingprojects earlier, and maintaining time-to market schedules in order to ensure the profitability ofan opportunity

• Securely leverages design-chain innovation to increase competitive position

• Help achieve cost and time savings through reuse of IP via consolidated systems

• Help reduce product corrective action preventative action (CAPA) issues and quarantineincidents through more complete product requirement and change accuracy

• Achieve product regulatory compliance governing the design and manufacture of medicaldevices intended for human use, which includes integrating compliance elements from FDATitle 21 CFR Part 11 for process histories and electronic signatures, CFR Part 820 for "GoodManufacturing Practice" (GMP)

• Create direct management of the Device History Record (DHR) with phase/gate design controlprocesses

• Establish internal/external audit and validation deliverable tracking for Device History File(DHF) records

Semiconductor industry

Semiconductor development is based on shorter life cycles, more competitive markets, and lessforgiving technology than ever before. Product complexity and density continue to increase,while average sales prices and margins continue to shrink. Problems that increase the length ornumber of design cycles, or mistakes that cause additional re-spins of a die, can make thedifference between profit and loss for a new product, or even result in project cancellation.

In order to help semiconductor companies address these challenges, ENOVIA products deliverthe following value:


• Manage complex integrated circuit (IC) configurations for analog and digital

• Collaborate with fabrication and IP partners on handoff of product configurations, mask prep,assembly, and test collaboration

• Manage issues from all levels of the organization, from conceptual design to execution

• Manage business processes for developing complex semiconductor products, includingproject tasks, deliverables, resources and risks, across multiple locations and partners

• Establish data-driven project management where changes to design data are immediatelyreflected in project plan

• Reduce mask spins and increase first-sample success rate by managing complex,multi-vendor/tool IC design data, and processes

• Help increase engineering efficiency through implementing comprehensive IP reuse, andhierarchical, top-down design methodologies, decreasing costs, and reducing the designproductivity gap

• Help remove process costs via automation, system consolidation, and data synchronization

• Allow for the adoption of quality methodologies and best practices for critical processes

Product positioning — Globalization

ENOVIA MatrixOne 10.8 program integrated information (PII) and softcopy product information isavailable for most products in:

• English

• French

• Italian

• German

• Japanese

PII is stored in compressed Unicode format (UTF-8) for worldwide exchange without loss ofmisinterpretation of characters.

Reference information

For information about ENOVIA VPLM V5.18, refer to Software Announcement 207-214, datedSeptember 25, 2007.

For information about CATIA Solutions V5.18, refer to Software Announcement 207-215, datedSeptember 25, 2007.

Trademarks

AIX, ClearCase, and Rational are registered trademarks of International Business Machines Corporationin the United States or other countries or both.

Microsoft and Windows are registered trademarks of Microsoft Corporation.

Linux is a trademark of Linus Torvalds in the United States, other countries or both.

Other company, product, and service names may be trademarks or service marks of others.

Additional details

Product name changes — summary

EM1 10.7 EM1 10.8


http://www.ibm.com/common/ssi/fcgi-bin/ssialias?infotype=AN&subtype=CA&htmlfid=897/ENUS207-214&appname=USN

http://www.ibm.com/common/ssi/fcgi-bin/ssialias?infotype=AN&subtype=CA&htmlfid=897/ENUS207-215&appname=USN

Matrix One Xxx ENOVIA XxxMatrixOne Application ENOVIA Collaboration PlatformDevelopment Kit (ADV) Application Development Kit (ADV)

MatrixOne Platform for ENOVIA Collaboration PlatformDevelopment and Test (DTE) for Development and Test (DTE)

MatrixOne Platform for File ENOVIA File CollaborationCollaboration (FCS) Server (FCS)

MatrixOne (MCAD/ECAD) ENOVIA CollaborativeIntegration Design for (MCAD/ECAD)

MatrixOne (ERP) Integration ENOVIA X-BOM for (ERP)MatrixOne VPLM Enterp X-BOM ENOVIA X-BOM for VPM V5 (VXB)Mgmt Integration (VXB)

MatrixOne VPLM Prgm ENOVIA Program ManagementManagement Integration (VPR) for VPM V5 (VPR)

MatrixOne JD Edwards Direct ENOVIA X-BOM for JD EdwardsIntegration (JDD) World (JDD)

MatrixOne Autonomy K2 ENOVIA Advanced SearchIntegration (AK2) for Autonomy IDOL K2 (AK2)

Configuration name changes — summary

EM1 10.7 EM1 10.8

MatrixOne Xxx Solutions ENOVIA Xxx SolutionsMatrixOne VPLM Enterp. ENOVIA X-BOM for VPM V5X-BOM Mgmt Solution (VPG) Solutions (VPG)

MatrixOne VPLM Program ENOVIA Program ManagementManagement Solutions (VXS) for VPM V5 Solutions (VXS)

Merging products

MatrixOne Platform (PLF), MatrixOne Application Exchange Framework (AEF), MatrixOne TeamCentral (TEA), and MatrixOne Business Metrics Module (BMM) products have been withdrawnand their functionality is included with ENOVIA Collaboration Platform (CPF).

Splitting products

MatrixOne Semiconductor Accelerator (SCD) is withdrawn and its functionality is split between:

• ENOVIA Semiconductor Accelerator for Team Collaboration (SCC)

• ENOVIA Semiconductor Accelerator for Design to Manufacturing (SDM)

• ENOVIA Semiconductor Accelerator for Enterprise Project Management (SEP)

• ENOVIA Semiconductor Accelerator for IP Management (SIP)

This release introduces nine new ENOVIA MatrixOne products and enhancements to 31previously announced products.

This section describes the new products and enhancements to previously announced productsdelivered in this release.

For descriptions of previously announced ENOVIA MatrixOne products and other PLM solutions,visit the PLM Web site

http://www.ibm.com/solutions/plm

New products in 10.8

The ENOVIA MatrixOne licensing model is based, depending on product, on a "Named-User"license or a "System License" concept.

This release of ENOVIA MatrixOne 10.8 introduces nine new products.

PLM Enterprise Foundation Domain

ENOVIA Collaboration Platform — Named User (5672-CPF)

The ENOVIA Collaboration Platform (CPF) product replaces the MatrixOne 10.7 product,MatrixOne Platform (PLF). ENOVIA Collaboration Platform (CPF) includes the functionality of


http://www.ibm.com/solutions/plm

these MatrixOne 10.7 products:

• MatrixOne Application Exchange Framework (AEF)

• MatrixOne Business Metrics Module (BMM)

• MatrixOne Team Central (TEA)

ENOVIA MatrixOne delivers the industry's most flexible PLM environment built with the needsand challenges of the global enterprise. A proven platform for global deployments, the ENOVIACollaboration Platform provides companies with a single, secure environment that eliminates thebarriers caused by geographically dispersed organizations and value chains. ENOVIACollaboration Platform enables unrivaled out-of-the-box functionality that incorporates the provenbusiness process best practices of some of the world's most innovative companies. Thefunctionality included in ENOVIA MatrixOne spans the entire product development life cycle,providing companies with the ability to rapidly adjust business process functionality to meet theirunique needs today and tomorrow, at the lowest possible total cost of ownership.

With ENOVIA Collaboration Platform companies can:

• Deploy PLM solutions to solve immediate business problems, and quickly support large globaldeployments

• Collaborate with external partners, suppliers, and developers as early as possible in thedevelopment process

• Increase external collaboration through role-based access, while maintaining network andinformation security

• Leverage the best practices developed in partnership with some of the world's most innovativecompanies while retaining the competitive advantage and adaptability

• Seamlessly integrate diverse environments, applications, and operating systems

• Gain powerful business benefits and metrics through global collaboration

The following standard capabilities are enabled by the ENOVIA platform:

• World-class scalability, performance, and openness — The ENOVIA CollaborationPlatform is a standards-based, open and proven platform capable of scaling to support thelargest, most complex deployments.

• Flexible dynamic modeling — The ENOVIA Collaboration Platform provides the flexibility toeasily configure business processes, user interfaces, and infrastructure options to ensure thatthey meet an organization's needs, while maintaining the lowest possible total cost ofownership.

• Virtual workspaces and process management — Virtual workplaces enable ad hoccollaboration for cross-functional and geographically dispersed teams to securely shareproduct content. All product development content can be routed for review and managed inrepeatable workflow business process.

• Metrics reporting — Drives continuous business process improvements to operate moreefficiently using pre-built metrics reports.

The ENOVIA Collaboration Platform has been enhanced with several API and modelingimprovements to create a seamless platform for managing requirements, functional, logical, andphysical product definition.

• Relationship-to-relationship (Rel to Rel) connections — Extend relationships to containother relationships and improving modeling techniques by associating additional data with aconnection or data associated with a parent/child combination

• Relationship interfaces — Extend interface capability to relationship objects for dynamicattribute definitions

• Relationship query API — Enables relationship connections to be searched directly, andeliminates the need to perform multiple expands to find the relationships of interest

• Organization-based access — Extend business objects meta-data with two additionalalternate owners (ENOVIA MatrixOne Users — group, role, person, or association) that canbe used along with expressions to control object-based access


• Policy and state enhancements — Set access rules for a given user across all states in thepolicy, which eliminates the need to replicate the same access permissions across everystate; access permissions from all-state and state-specific permissions are combined todetermine the object permissions at a state

• Streaming queries and expands — Includes a more efficient mechanism that maintains aconstant memory profile on the server when processing queries and expands by retrieving 'N'objects at a time

• File download/upload triggers — Manipulate a file at the file server before storage orbrowser transfer to support extensions such as virus checking, encryption, decryption, and soon

Structure browser strengths

• Expand Filter function enables users to expand one or more levels at a time including 'All'levels.

• Additional filters can be established by implementers to confine the expanded data based onthe filter criteria.

Third-party product support changes

• Windows® 32- and 64-bit Support for Client/Server

– Windows Server 2003

– Windows XP (client)

– Windows Vista® (client)

• MySQL 5.0 database support

• DB2® 9.1 support; replacing DB2 8.2.x

• JRE 1.6 support for browsers

• Firefox 2.0 browser support

Server license control

• Includes license Control mechanism to enforce ENOVIA Collaboration Platform deploymentsfor production, development, and test environments

• Requires the presence of a valid license file during server startup

• Includes license file is per machine, based on the MAC address of the machine

• Provides licenses for failover machines

• Provides multiple licenses with limited sessions for individual development and test sandboxenvironments as part of the ENOVIA Collaboration Platform for development and test product

• Requires that customers, professional services, and partners explicitly request a license keyfor each ENOVIA Collaboration Platform (CPF) server/machine

ENOVIA Collaboration Platform scalability, performance, and openness

ENOVIA Collaboration Platform serves as the foundation for ENOVIA MatrixOne and is theunderlying engine for ENOVIA Collaborative Business Process products, modeling capabilities,and third-party system integrations. A proven, standards-based offering, the ENOVIACollaboration Platform is built to support global, enterprise-wide deployments and is equippedwith the industry's highest level of performance and scalability, making it an ideal platform tosupport the product development process in any enterprise, or in any industry. Key features andcapabilities include:

• World-class scalability — The scalable architecture of ENOVIA Collaboration enables theaddition of database servers and industry-standard Web application servers for load balancingand geographically dispersed deployments. In addition, file storage and replication servicesalso enable efficient file server distribution. The ENOVIA Collaboration Platform includesstandard centralized file storage. Optional remote file collaboration servers can be deployed atwork sites throughout the world. As a result, large files remain close to the users who accessthem most frequently, while ensuring that all users worldwide enjoy easy access to those files


as needed.

• Secure work environment — The ENOVIA Collaboration Platform provides several levels ofsecurity:

– User

– Policy

– Object

– Attribute

A user must pass security requirements at each level in order to gain access to the data. Inaddition, distinct access masks are available for granular access control. Over 30 accessmasks are available like read, modify, delete, and so on.

• Single Sign-On (SSO) — Many companies consolidate their application access using a singlelogin for centrally managing user access and privileges. The ENOVIA Collaboration Platformprovides advanced LDAP/SSO integration that ensures common authentication andadministration based on the company's standard identity management solution.

• Standards-based open environment — The platform's standards-based open environmentenables organizations to quickly and easily implement a PLM strategy across diverseenvironments and applications and platforms. In addition, adaplets enable customers toextend standard ENOVIA MatrixOne product capabilities to create a PLM federation with otherenterprise systems; an adaplet is an ENOVIA MatrixOne proprietary technology tocommunicate with other data sources and represent this data as if it is native to the ENOVIAMatrixOne system.

ENOVIA Collaboration Platform flexibility

ENOVIA MatrixOne is an environment designed from the ground up to support change andflexibility. As an organization's processes change, users can easily change the standardprocesses and user interface to retain their competitive advantage. Companies can easilyconfigure solutions to meet specific business needs. The ENOVIA Collaboration Platform'sdynamic and flexible schema and built-in modeling tools enable organizations to quicklyconfigure applications without expensive time-consuming coding. Key features and capabilitiesinclude:

• Dynamic modeling — The ENOVIA Collaboration Platform provides the flexibility to easilyconfigure business processes, user interfaces, and infrastructure options to ensure that theymeet an organization's needs, today and tomorrow, at the lowest possible total cost ofownership. This flexibility is provided while still allowing for easy future product upgrades.

• User interface components — A rich set of user interface tools are provided to deliversignificant functionality with minimal programming effort in order to easily change thepresentation and capabilities of standard ENOVIA MatrixOne products and best of all,changes are upgradeable with future software updates. The user interface tools areaccess-controlled to provide role-specific views and are used to model the entire userexperience (menus, forms, tables, structure, actions, and so on) in the user's preferredlanguage.

ENOVIA Collaboration Platform virtual workspaces and process management

Virtual teams are essential in order to compete in today's environment of outsourced productdesign and manufacturing, and compressed product life cycles and custom productconfigurations. These teams require a robust set of collaborative services to dramaticallyincrease the innovation, speed, and effectiveness of core processes, such as productdevelopment, program management, strategic sourcing, and supplier management. Key featuresand capabilities include:

• Assemble virtual teams — Users can create a collaborative digital workplace of global teammembers, called a workspace. A workspace can be used by geographically distributed teammembers who offer expertise from various disciplines like design, engineering, manufacturing,procurement, and finance. Within the secure workspace, members can create folders, andorganize, view, review, mark-up, and approve documents and other product data, andsubscribe to event notifications and schedule meetings.

• Secure access — Allow workspace leads to set default access definition for each member tothe workplace, and folder structures. This access controls the user's visibility for the


workspace, the folder hierarchy, and the content managed within the folders.

• Manage documents and content — Manage and organize shared documents and structuredproduct data (such as parts and request for quotes (RFQs)) in multi-level folder and sub-folderstructures. Users can also revise, check in/check out documents, and review history andcomments.

• Manage workflows — Companies can use workflow management capabilities to modelrepeatable business processes for creating business objects in ENOVIA MatrixOne based onan organization's standard operating procedures. Administrators can create standard processtemplates that define a network of activities that must be completed. These activities arelinked together with conditional expressions to ensure that different activity sequences arepursued, or to repeat activities. The workflow activities can be performed by users of ENOVIAMatrixOne or they can launch programs to automatically perform the required tasks.

• Manage life cycle and approvals — Each ENOVIA MatrixOne business object goes througha life cycle that captures the steps (or states) of its creation, review, release, andobsolescence. These life cycles are configurable per object type, and a single object type canhave multiple life cycles. To go from one state of a life cycle to another, electronic signatureapprovals are often needed. An administrator can define fixed signatures for certain lifecycles, or choose to use a route for dynamic or ad hoc signatures.

A route contains several steps of approval that must occur. Each step can contain one ormore signatures for specific individuals or roles. The route must be completed before thebusiness object is promoted to its next life cycle state. Dynamic routes are defined by theadministrator and automatically started when a specific life cycle state is reached. ad hocroutes are created by end users to get the approval they think is required. In both cases,standard route templates are leveraged to facilitate a repeatable approval process.

• Automatic notifications — Users can use subscriptions to proactively be notified whenproduct data changes of interest occur. Using subscription management capabilities, userscan either subscribe to any data element or have administrators automatically subscribe themusing pushed subscriptions.

• Create discussion threads — Users stay up-to-date with the latest information by monitoringdiscussion threads of interest. Users have the ability to subscribe to individual threadeddiscussions along with monitoring actively discussed topics throughout the system.

• PDF rendering with Adlib Express — ENOVIA MatrixOne user interfaces can be extendedwith PDF rendering functionality and configurable watermarks to provide a standard, read-onlyformat for sharing with non-ENOVIA MatrixOne users and archiving. PDF rendering of formsrequires Adlib Express Server™, which is licensed separately from Adlib Software.

ENOVIA Collaboration Platform business metrics

Companies are constantly looking for ways to differentiate in an increasingly competitive market.While most of the attention is focused on improving products and services, more companies aredifferentiating themselves by how they do business. The ENOVIA Collaboration Platformprovides reporting capabilities focused on metrics and statistics to better assess the performanceof an organization. Key features and capabilities include:

• Pre-built reports provide answers to key questions in the shortest time — The ENOVIACollaboration Platform provides several reports for improving the decision-making process.These reports are based on ad hoc queries that can be executed in real-time in order tomonitor the organization's performance. Users and business managers personalize these tokeep track of the metrics most important to them on a daily basis. All report data can bepresented graphically and in a table that calculates changes from period-to-period. In addition,the data can be exported to spreadsheet for further analysis.

• Streamline business processes by eliminating non-value-add activities — Organizationscan streamline the business process by analyzing process steps and eliminating non-valueadded activities. The "Lifecycle Duration Report over Time" report allows users to analyze thecycle time it takes to complete the development process. Analysis of this information canindicate bottlenecks in the process. Changes can then be made to the workflow process, orlead to new initiatives, such as training programs or allocation of additional staff, in order tocontinually monitor and improve the process. This report is intended to provide answers for:

– What state in the life cycle is a bottleneck to overall performance?

– How much time does an object spend in its preliminary review versus its cross-functionalreview?


– How have past process improvements impacted the time spent at each step in the process?

Track performance indicators to understand how new decisions affect the company'sperformance

There are several standard reports for measuring current activities, workloads, trends, andthroughput. These reports enable organizations to focus on the business process and relatedactivities as a mechanism to quickly react to business changes. With relevant and timelyinformation of the business operations, users can make more informed decisions. The standardreports include:

• Object Count report — This report is focused on reporting current activity or trends based on auser-specified query and summarizing and grouping the results graphically or textually. Oneexample for such report could provide the following answer: How many incidents are currentlyopen and who they are assigned to?

• Object Count over Time report — This report can be more generalized by allowing the user tofilter the data on any criteria and grouping by any date-based field. For example, the followinginquires can be answered:

– How many issues by priority are being opened?

– How did the reduction-in-force in Customer Support impact the number of issues that arecompleted?

– How many issues are being closed by person X along with their priority?

In each of these cases, the data is grouped by a date field like originated date, completeddate, or closed date.

• Object Count in State report — This report graphically shows the number of business objectsof a given business type that have reached a given state like Released in order to assess thethroughput of the organization. Examples of this report include:

– How do summer and holiday vacations impact the number of parts that are released?

– How did the reduction-in-force impact the number of ECRs that are completed?

– How did the recent hiring in quality engineering affect the number of Incidents raisedagainst a product?

Configure pre-built metrics reports to suit precise business requirements

Users can easily configure any of the pre-built metrics reports to suit the organization's precisebusiness requirements. The standard reports are generic and can accept user input in order toestablish the data set for the report, or business administrators can predefine the reports so theycan be executed without user input.

Personalize dashboard to suit a user's unique reporting needs

End users can not only execute reports at any time, but they can also define their ownpersonalized dashboards with the reports that best suit their needs. The dashboard provides asingle version of the information that connects goals to reality, helping users confront pressingbusiness issues and execute more effectively.

Interface Crystal reports

Companies can take advantage of third-party software analysis and reporting tools from Crystalproducts. Crystal products offer a high degree of flexibility and control over how data ispresented and formatted. Administrators can create virtually any report using formulas,cross-tabs, conditional formatting, summary/drill-down, and sub-reports, and enable them for aninteractive end-user experience. The ENOVIA Collaboration Platform includes an interface toCrystal products that can extract ENOVIA MatrixOne data through standard APIs and pass it toCrystal products for formatting and output. The Crystal products include Crystal ReportsProfessional XI R2 and BusinessObjects Enterprise XI R2. These are licensed separately fromENOVIA MatrixOne.

Software requirements

Supported platforms for ENOVIA Collaboration Platform (CPF)

• Solaris 10 (SPARC & Opteron x86)


• HP-UX 11i (PA-RISC)

• AIX® 5.3 TL05-03+ (Power 4 & 5)

• Windows Server 2003 SP2® (x86)

• Red Hat Enterprise Linux™ 5 (x86)

• Windows Vista (x86)

• Windows XP SP2 (x86)

ENOVIA Collaboration Platform Workgroup Architecture — Named User (5672-CPW)

ENOVIA Collaboration Platform Workgroup Architecture establishes the necessary environmentfor ENOVIA MatrixOne applications in a workgroup setting with minimal administrative effort andaccelerated deployment. Installation is automatic, along with the configuration of the databaseand web application server. Furthermore, the ENOVIA Collaboration Platform, including themodeling capabilities, business process data model, and business process services, are alsoinstalled.

Using the ENOVIA Collaboration Platform Workgroup Architecture, can save money and timeand eliminate dependencies on corporate IT staff.

Key features and capabilities include:

• Simplified installation — ENOVIA Collaboration Platform Workgroup Architecture simplifiesthe installation and setup of the ENOVIA MatrixOne system using an automated installationprocess that deploys the necessary third-party product requirements automatically. Theseinclude the installation and configuration of the underlying database and application server.

• Minimal administrative support — The ENOVIA Collaboration Platform WorkgroupArchitecture does not require significant knowledge for database administration or Java™ 2Platform, Enterprise Edition (J2EE) application deployments. The tasks for installing theMySQL database, Tomcat Application Server and SUN Java Development Kit (JDK) aredelivered and configured automatically. This software is included with the ENOVIACollaboration Platform's distribution. An administrator merely has to load the product CDs (orelectronic distribution) and follow the instructions. No additional administrative preparation ortasks are necessary.

• Full PLM capabilities — ENOVIA MatrixOne delivers the industry's most flexible PLMenvironment and provides unrivaled out-of-the-box functionality that incorporates the provenbusiness process best practices of some of the world's most innovative companies. The fullbreadth of ENOVIA Collaborative Business Process products are fully qualified with theENOVIA Collaboration Platform Workgroup Architecture.

ENOVIA Schema Analyzer — Development System License (5674-SCH)

ENOVIA Schema Analyzer enables companies to accelerate conceptual design, specification,maintenance, and documentation of the ENOVIA implementation using a combination ofgraphical and textual Windows-based user interface.

Administrators can use ENOVIA Schema Analyzer for managing daily schema development andmaintenance activities while implementing new releases of ENOVIA MatrixOne products. Thetool can be used with any implementation including standard products as well as customdeveloped products.

Main features include:

• Designing and defining the data model before building it. This is accomplished with thestandard function Unified Modeling Language (UML). UML is an industry-accepted standardfor specifying, visualizing, constructing, and documenting the business model.

• Using the ENOVIA Schema Analyzer to compare different schema implementations to seeand report any differences and make plans to take appropriate actions. Upgrading to a newrelease and reconciling schema differences is simplified using automatic comparison reports.

• Developing and reviewing schema extensions offline and then synchronizing changes backinto the database.

• Generating schema reports in both Word and HTML is easy and fast, saving significant timeand effort.


The detailed capabilities of the ENOVIA Schema Analyzer include:

• Schema explorer — Administrators connect to the ENOVIA MatrixOne database and extractthe schema into a neutral-format local file. The local copy of the schema is then used forviewing, reporting and deciphering the data model. All ENOVIA MatrixOne schema modelingentities like Business Types, Policies, Attributes, and so on, are extracted for analysis andcomparison. Relationships between the various administrative schema objects are alsocaptured so that the dependency of one schema element with another is understood.

• Offline schema development — Making ad-hoc changes directly to a live schema can havenegative impact on the application especially if these changes are incomplete and completionspans multiple days or weeks. The ENOVIA Schema Accelerator enables offline modelchanges without impacting the live development environment. Once changes are reviewedand finalized within the tool, they can be synchronized with the ENOVIA MatrixOne database.

• UML modeling — With UML functions, project teams can communicate, explore potentialdesigns, and validate new schema requirements. UML diagrams are automatically createdduring the initial schema extract process. Each UML diagram reflects a portion of the schemamodel representing the business type, its type hierarchy, relationships, and attributes. NewUML diagrams can also be created interactively representing existing schema, as well as newschema elements. The diagrams can then be exported to a database to create or modify therepresented schema model, as well as exported as GIF files for documentation.

• Schema comparison — During an implementation, administrators are working with multipleschema instances; that is, local and shared instances or development and QA environments.Keeping these schema models synchronized, or even knowing if they are synchronized canbe difficult. With the ENOVIA Schema Analyzer, administrators can compare multipleinstances, and automatically update one based on another. The schema comparison toolsprovide much flexibility in identifying how the comparison should be performed and whetherthe comparison should be interactive with visual or written to a file.

• Simplified upgrades — Upgrading to a new ENOVIA MatrixOne product release can besimplified with the ENOVIA Schema Analyzer. Implementers can compare the vanilla instanceof the new product release to the existing production system where they can see and report allschema differences and make plans to take appropriate actions. The schema comparisonreports compare all schema elements including program objects written with Java and toolcommand language (TCL) code.

• Automated documentation — At the end of the design and development cycle,implementers can easily and instantly generate schema documentation in the ENOVIAMatrixOne system in both HTML and Word formats saving time and effort and eliminatingerrors. With a simple command, the entire schema report along with table of content,diagrams and images can be generated.

• Nightly archives — The ENOVIA Schema Analyzer enables users to schedule nightlyextracts and reports of the ENOVIA MatrixOne schema for archiving purposes. Thisautomation includes extraction of the ENOVIA MatrixOne schema model, generation of theschema report, and schema comparison reports against a previous baseline. The nightlyautomation can be useful for project leaders to track progress against a previous baseline aswell as retain archives of the entire schema and documentation.

IP Modeling domain

ENOVIA Collaboration for Adobe Illustrator — Named User (5672-ADI)

The ENOVIA Collaboration for Adobe Illustrator is designed to create and access PLM-manageddata directly from within the native Adobe interface. This enables design teams to manage datawithin PLM and share data across the enterprise while not disrupting the established productivityof those teams. Organizations can now collaborate much more effectively and in parallel with thedevelopment processes instead of after the design has already been completed. Design teamscan evaluate and maximize operations to establish and exploit best practices. In addition thenative integration to Adobe Illustrator supports a rapid adoption of the ENOVIA ApparelAccelerator for Design and Development by minimizing end-user training.

ENOVIA Collaboration for Adobe Illustrator key features include:

• Manage artwork Views — User can manage their data in a single file and have the systemautomatically generate multiple views based on pre-defined layers (for example, clean front,back, and line drawing).

• Securely distribute product content — The ENOVIA Collaboration Platform controls accessto product content based on company and/or brand level rules.


• Communicate changes — ENOVIA MatrixOne users can easily subscribe to changes tonative files and alert users when changes are made.

• Promote company standards with document templates — Design teams can leverageexisting templates managed in ENOVIA MatrixOne; new content is created based onestablished company standards.

ENOVIA Collaborative Interference Management — Named User (5672-IMC)

ENOVIA Collaborative Interference Management provides analytical capabilities that allowdesigners to understand the full impact of change, as well as to collaborate with othernon-engineering groups around the world that also provide valuable input.

ENOVIA Collaborative Interference Management provides an analytical business process forcapturing digital mockup (DMU) activities to assist in making decisions on changes that not onlyaffect designs, but as well the products that the designs support. With the DMU process beingmanaged in ENOVIA MatrixOne, visibility and control of the associated items affected by achange can be identified before any change orders, or research and development activity takesplace.

The results of the analysis can be shared outside of traditional engineering so that all involved inevaluating a design change can collaborate and provide feedback before any significant work isdone.

Highlights include:

• Specify CAD model structure for analysis — Using a menu structure within ENOVIADesigner Central, the user can specify the assembly where the interference needs to be run,and ensure that CAD models at the correct revision and version from the ENOVIA PLMsystem are analyzed for interferences. The user can specify several tests on the same CADstructure if desired.

• Analyze structure — Specified CAD structures are sent to a background process thatanalyzes the CAD structure and identifies the clash areas. The results of the analysis arecaptured as interference objects that are associated to the design models that were specified.

• Viewable results — The results of the analysis are captured as 3D XML files, and placed intointerference objects. The results can be viewed by 3D XML Player, 3D Live and DMU V5.

• Load affected models into DMU V5 — The user can view the 3D XML files using DMU V5,and the models that are associated with the interferences can also be loaded into the DMU V5session through ENOVIA Designer Central. The "what if" scenarios can be played out usingDMU V5.

• Check in changed models into Designer Central for re-computation — As design modelsare changed within DMU V5, the user can check in the models through ENOVIA DesignerCentral and re-compute the analysis to see how the design changes have affected theprevious clashes.

• Extend collaboration to a global team — Standard ENOVIA Collaboration Platformcapabilities such as routes, workflows, and discussion threads can be used to communicateintent and gather feedback from product teams throughout the world. Tracking mechanismssuch as "Issues" can be associated with the results from an interference simulation to trackfinal resolution and team input.


While ENOVIA Collaboration Interference Management (IMC) only has a licensing prerequisite ofthe ENOVIA Collaboration Platform (CPF), in order for it to work, the following must exist for aleast one user at the same release level of ENOVIA Collaborative Interface Management:

• ENOVIA Designer Central

• ENOVIA Collaborative Design for CATIA V5, ENOVIA Collaborative Design forPro/ENGINEER, ENOVIA Collaborative Design for UGS NX, or ENOVIA Collaborative Designfor SolidWorks

In addition, at least one seat of ENOVIA DMU V5.17 SP8 and V5.18 SP2 must exist.

Collaborative Business Process Domain

ENOVIA Semiconductor Accelerator for Design to Manufacture — Named User


(5672-SDM)

This new product, derived from MatrixOne Semiconductor Accelerator V10.7 (SCD), includespreparation of the operations BOM to link design to manufacture as one of its supported usagemodels.

ENOVIA Semiconductor Accelerator for Design to Manufacture (D2M) enables preparation of theintegrated circuit (IC) BOM. It aligns marketing requirements to design outputs, and assures theefficient flow of the right information at the right time across the product design, manufacturing,and assembly and test teams.

The ENOVIA Semiconductor Accelerator for Design to Manufacture is a singular, secureplatform for supporting the product development process. It provides a single repository to storedata, documents, product configurations, and change information.

Benefits include:

• Eliminating errors in the operations BOMs by automatically creating it from the productconfiguration

• Avoiding project schedule delays by notifying design and manufacturing partners of BOMchanges

• Preventing invalid product configurations during manufacturing or after product release

• Improving collaboration between marketing, engineering and manufacturing for faster time tomarket

The ENOVIA Semiconductor Accelerator for Design to Manufacture provides the followingcapabilities:

• Control complex product configurations — Product managers and designers can validateconfigurations before driving downstream processes in development or manufacturing for anew product or variant. IP reuse capabilities are greatly enhanced across new products orproduct variants. Ensuring that only correct products are built using the right componentsdramatically reduces late charges and increases product margins.

• Automate the creation of the multi-level IC BOM — Product marketing and engineeringneed the ability to automatically create multi-level BOMs from re-usable product features andoptions, using pre-defined product configuration rules. Existing design IP can be automaticallyattached to the BOM for reuse, while unrealized or new BOM items are assigned placeholdersfor design, review, and release to production. Both consumable as well as non-consumableitems are supported in the context of the product process life cycle. Being able to determineexactly what goes into making the product, including hardware, software, materials, andresources, increases quality, reduces warranty costs, and improves design to manufactureefficiency.

• Access to time-phased manufacturing yield data to support key product decisions —Online access to estimated and actual yield data for configured products allows for productplanning of similar products or variants. This capability helps track manufacturing performanceto identify areas of improvement.

In addition, ENOVIA Semiconductor Accelerator for Design to Manufacture leverages thefollowing standard capabilities provided with ENOVIA Product Central and Engineering Central inorder to manage the semiconductor BOMs:

• Repeatable engineering change process — All updates to the BOM and its designs can bemanaged with a formal change process, enforcing consistent business rules for review andapproval. Suppliers and design partners can be included for notification, input, and review in acontrolled, real-time environment.

• Centralized information sharing along the design chain — Information that is vital to makeproduct decisions that get the correct product out of the door is shared in real-time among allstakeholders, including:

– The design database sent from design to mask prep

– Pattern layout data and mask layout instructions sent to the mask supplier

– Pricing, quality, and schedule information between the customer and supplier

– Compliance information to the wafer fab

– Parametric data, design rules, and process data from manufacturing back to design


• Ease of coordination between marketing, design and manufacturing for salable partprocesses — The ability to support marketing ID part numbers for any level in the BOMincreases flexibility to react to customer and market requirements with maximum efficiencyand control.

• Approved vendor lists (AVL) and approved manufacturer lists (AML) management —Easy access to preferred and qualified manufacturing location status supports optimization ofsupplier selection results. Consistent processes for rating and improving supplier performancecreates capabilities for continuous supply chain improvements.

• Secure and robust supplier collaboration — Use of secure collaboration workspacesallows for easy transfer of design and manufacturing IP to fabs, assembly, test partners, andsites. Granular access control assures that external partners see only the right information atthe right time.

• Support for product end-of-life (EOL) processes — Product EOL life-cycle support allowsfor consistent business processes to retire products, and coordinating communicationbetween design, manufacturing and customers.

ENOVIA Semiconductor Accelerator for Enterprise Project Management - Named User(5672-SEP)

This new product, derived from MatrixOne Semiconductor Accelerator V10.7 (SCD), includesenterprise project management as one of its supported usage models.

ENOVIA Semiconductor Accelerator for Enterprise Project Management delivers a number ofpre-configured design flow templates, which allow semiconductor companies to begin newdesign projects using a consistent process across all design teams and locations. Templates canbe used as-is or modified to include a company's best practices. The result is design teamsworking in a consistent, auditable fashion, and reporting project status directly from their designtools for real-time accuracy without impacting productivity.

With ENOVIA Semiconductor Accelerator for Enterprise Project Management, companies can:

• Provide visibility to their project managers of daily design progress in order to determine ifthere are early warning signs that could prevent an on-time completion

• Allow design teams to collect metrics for increased efficiency and quality, and predict futureperformance

• Provide program managers with status information rolled up across multiple projects in theprogram hierarchy

• Manage resources across the enterprise project teams and find the right resource at the righttime for critical design tasks

• Use standard processes and best practices across all business units and design locations

• Manage complex collaborative projects that include stakeholders across the extendedenterprise — prospects, customers, suppliers or partners

ENOVIA Semiconductor Accelerator for Enterprise Project Management provides the followingcapabilities:

• Industry-standard project management templates — Projects can be planned andimplemented using pre-defined templates for familiar IC design. They provide a consistentmanner for planning and measuring project status and expected results. These templates canbe used either "out-of-the-box" or as a model for customer-specific flows. The followingtemplates are available:

– Digital IC Design Flow

– Analog/Full Custom Design Flow

– CMOS Manufacturing Process

– Design Flow

– Microprocessor Design Flow

– ASIC Design Flow

– Memory IC Design Flow

– FPGA Design Flow


– IP Quality Checklists

– New Product Introduction (NPI) Business Processes

• Data-driven project management — Designers will continue to work within their usualelectronic design automation (EDA) design environment. Changes that they make to thedesign data will automatically drive updates to the project plan, enabling project and programmanagers to obtain real-time information when making critical decisions.

• DesignSync deliverables — Deliverables are directly linked to semiconductor data managedby ENOVIA Synchronicity DesignSync design data management (DDM) solution. DesignSyncis the industry standard for semiconductor DDM that provides the underlying vault for bothproduct designs and reusable IP. Users in the ENOVIA MatrixOne environment can browsethe DesignSync data directory hierarchy, view the content, and check-out/in as required. Acentralized enterprise-wide system can work with multiple project-level DesignSync serversacross the organization or multiple project-level systems may be set up alongside eachDesignSync server. ENOVIA Synchronicity DesignSync is currently not an IBM offering.

ENOVIA Semiconductor Accelerator for Enterprise Project Management extends the followingstandard capabilities provided with ENOVIA Program Central to provide a focusedsemiconductor project management solution:

• Planned project activities and milestones — Project management features enable projectleaders to organize global project teams, plan and coordinate phase gate activities, andassign and organize tasks associated with the project. The task list also functions as areal-time scheduler, giving the entire project team an immediate status update as each task iscompleted.

• Tracked project financials — Through the use of financial features, project leaders cancapture and manage actual and estimated project costs and benefits. Users can then easilyview the status of the plan to see how well financial needs are being met.

• Leverage of desktop tools — ENOVIA Program Central supports the ability to create andmanage project schedules and assign tasks to global teams according to preferredmethodology. Through the full bi-directional Microsoft® Project integration, project leaders canleverage Microsoft Project as a front-end to create and maintain project schedules and thenre-import schedules and assigned resources back into ENOVIA Program Central forexecution.

• Task deliverables — Users can automatically update a task's status to "complete" byassociating the task's deliverable to the task itself. Once the deliverable is promoted to"complete" status, custom triggers automatically promote the task to "complete".

• Process to approve new concepts — ENOVIA Program Central supports all phases ofdevelopment, including the idea generation phase in which the organization evaluates thelikely value and feasibility of a potential new project. Once a concept is approved, it is updatedto an actual project and can be planned in detail.

• Mitigate project risks — Through basic techniques of analysis and measurement, risks areproperly identified, classified, and managed. Risks are prioritized to identify which should bemitigated due to their potential extreme impact, which should be given normal attention, andwhich are sufficiently minor and do not require significant attention.

ENOVIA Semiconductor Accelerator for IP Management — Named User (5672-SIP)

This new product, derived from MatrixOne Semiconductor Accelerator V10.7 (SCD), includessemiconductor IP management as one of its supported usage models.

ENOVIA Semiconductor Accelerator for IP Management improves a semiconductor company'sIP and design reuse to create a competitive advantage by accelerating product development anddelivery. IP catalog owners can easily classify and organize data in a hierarchy that is tailored totheir company's business environment and products.

With ENOVIA Semiconductor Accelerator for IP Management, companies can:

• Ensure that projects leverage IP reused from previous products, resulting in shorterdevelopment times and lower schedule costs

• Aggregate all potentially reusable designs into a single system to make it easy for componentsto be reused

• Make it easy for design teams to search for reusable components to prevent starting a new


design unnecessarily

• Apply consistent attributes to define product IP and comparisons can be made to select thebest component for reuse

• Determine how the investment in reusable components is benefiting the company

• Track down which products need to be updated with an issue resolution fixes

• Verify that the correct royalties are paid for purchased IP based on what has actually beenshipped in products

• Avoid releasing products with problems that have been known to be fixed in other products

ENOVIA Semiconductor Accelerator for IP Management includes the following capabilities:

• Semiconductor IP taxonomy — Industry-standard taxonomy and attributes based-VSIAstandard enable companies to quickly customize classification definition to meet a company'sspecific products and IP.

• DesignSync file upload and download — Deliverables are directly linked to semiconductordata managed by ENOVIA Synchronicity DesignSync design data management (DDM)solution. DesignSync is the industry standard for semiconductor DDM that provides theunderlying vault for both product designs and reusable IP. Users in the ENOVIA MatrixOneenvironment can browse the DesignSync data directory hierarchy, view the content, andcheck-out/in as required. A centralized enterprise-wide system can work with multipleproject-level DesignSync servers across the organization or multiple project-level systemsmay be set up alongside each DesignSync server. ENOVIA Synchronicity DesignSync iscurrently not an IBM offering.

The semiconductor-specific IP management capabilities leverage the following standardcapabilities provided with ENOVIA Library Central to provide a solution unique to thesemiconductor industry:

• Enterprise-wide reuse catalog — Product development teams can completely and efficientlysearch a company's entire set of reusable design IP components using a single applicationavailable across the entire organization.

• Flexible "N-level" classification taxonomy — IP librarians can customize thesemiconductor classification system to each company's business needs and products. Thelibrary classification hierarchy can be managed in a live system without having to change theunderlying database schema. Therefore, the librarian can manage the library and taxonomyrather than going through an expensive IT-based modification of the underlying system.

• Standard attribute definitions — Reusable sets of attribute definitions can be easily definedand applied to the semiconductor classification hierarchy. The attributes have formal meaningto the taxonomy and can be inherited from class to sub-class. Inheritance of the attributesreduces the effort to create and maintain the classification system. It also enables attributes tobe applied consistently across classes. Because the maintenance effort is low, the systemsare flexible and are easily refined.

• Parametric search and comparison — A powerful, yet simple to use search capabilitymakes it easy to locate design components based on complex sets of reuse criteria. Itprovides a sophisticated comparison of the results, which easily identifies differences to allowfor quick and easy sorting and ranking. The low effort to search means that the system iscompletely scanned and the best available component is identified, instead of the firstadequate one encountered.

• Library IP issue tracking and management — IP consumers can easily report issuesagainst specific components or make requests against the library for desired new functionality.Issue category/classification provides users the ability to automatically assign all new issues toa pre-defined issue manager. Issues can be sub-typed to allow for a fine-grained definitionand ease of management. Subscriptions allow consumers to be notified when new issues areraised against components they are using.

• Cross team collaboration — Teams beyond engineering can easily add their own content tothe overall product knowledge. This provides the ability to classify the non-engineering data inthe same classification system alongside the engineering data, or classify it in its own librariesusing a bookshelf and document organization.

• Role-based library classifications — Multiple IP taxonomies can be defined tosimultaneously organize the same components from the perspective of different roles. Each


role can view the product data through its own library with its own classifications. Each libraryhas its own attributes that are inherited based on where the component is in the taxonomy andcan be browsed and searched within its role-specific definitions. This makes it very easy foreach role to find data from their own context but within the same common IP database.

• Usage and download tracking/reporting — When enabled, data is captured on wherespecific pieces of IP are being used and how it has been downloaded. Simple to useout-of-the-box reports provide summary information including who is using the IP, its purpose,when it was downloaded, state of the download, and status.

• Royalty management and contract obligations — Alternative, role-based classificationsystems such as those specific to legal and business requirements can easily be defined andapplied to engineering product data. Routes can be used to automate approvals andcompliance processes, reducing overhead and eliminating errors. Contracts and otherrelevant legal documents can be directly linked to the reuse data within the PLM system,enabling IP usage to be automatically tracked for payments to be correctly made and reportsto be automatically generated to ensure compliance is maintained.

• Life-cycle subscriptions — Users can subscribe to automatic notifications for key eventssuch as new pieces of IP being added to the library, or changes being made to existing items.Subscriptions can be attached to the entire libraries or to individual components. Notificationcomes in the form of an automatically generated e-mail and can include attached descriptions,and links to the relevant library or components for easy navigation. This means that all teamsmaking use of data from the library can make decisions based on up-to-the-minute status ofissues and updates, rather than static knowledge captured at the time of reuse.

ENOVIA Semiconductor Accelerator for Team Collaboration — Named User (5672-SCC)

This new product, derived from MatrixOne Semiconductor Accelerator V10.7 (SCD), includessemiconductor team collaboration for issue management as one of its supported usage models.

ENOVIA Semiconductor Accelerator for Team Collaboration provides Web-based issuemanagement and collaboration in secure, structured, and virtual workplaces for ad-hoccollaboration amongst cross-functional and geographically dispersed teams. Members cancollaborate on design data (including that managed by ENOVIA Synchronicity's DesignSyncDesign Data Management (DDM) solution), documents, and other product content throughdiscussions, notifications, alerts, and review/approval processes.

Benefits of the ENOVIA Semiconductor Accelerator for Team Collaboration include:

• Allow project members to associate issues directly to semiconductor design data for quickerresolution that avoids schedule delays and cost overruns

• Provide accurate issue status to avoid uninformed management decisions

• Track all key issue management communications to avoid delays

• Enable traceability between the design and issue management decisions by capturing onlinediscussions that can be searched and audited

• Delivers non-engineering inputs to the issue management process to quickly reach aresolution and avoid project interruptions

• Ensure a standard repeatable issue management process to obtain input from allcross-functional stakeholders and drive continuous improvement

• Provide data access controls that avoid financial and legal risks

The DesignSync File Access capability in ENOVIA Semiconductor Accelerator for TeamCollaboration allows team members to collaborate on design data managed by ENOVIASynchronicity's DesignSync design data management (DDM) product, in addition to productdocumentation. With this capability, semiconductor designers can browse the ENOVIASynchronicity DesignSync data directory hierarchy, view the content, and upload and downloadfiles as required. A centralized enterprise-wide system can work with multiple ENOVIASynchronicity DesignSync project-level servers across the organization. Users can understandthe state of the design at a glance by viewing status, tags, comments, and content ofDesignSync data. ENOVIA Synchronicity DesignSync is currently not an IBM offering.

In addition, ENOVIA Semiconductor Accelerator for Team Collaboration leverages the followingstandard capabilities from the ENOVIA Collaboration Platform:

• Collaborate securely — Easily and effectively create secure collaborative workspaces thatallow suppliers and partners to be involved with the DesignSync project team early and


throughout the product development process, and assign responsibilities with default andaccess rights to members and teams

• Define virtual teams — Add team members, assign roles and responsibilities, and providedefault access online to quickly and easily assemble cross-functional teams in virtualworkspaces.

• Manage and track issues — Easily raise issues against design data or any other object inthe enterprise system. Direct issues through configurable routes and track them to companyor project specific life cycles.

• Management reports — Track DesignSync design issue workloads and trends usingconfigurable graphical metrics-based reports with data summaries and roll ups. CrystalReports can also be leveraged for more advanced formatting options.

• Create discussion threads — Create multi-threaded discussions in order to share ideas andreference documents. Subscribe and automatically receive ongoing communication to keepabreast of developments and final decisions. Easily sort items discussions by workspace,folder or content, or search them to find exactly the information required to answer an inquiry.

• Implement company best practices — Promote the company's best practices by createrouting templates and folders, add files and content to folders, and generate routing path,approval lists and actions using delegation rules, task escalation rule, and additional routelogic. Implement checks that enable the automation and enforcement of standard practicesacross the entire enterprise.

• Decision/History capture — Automatically capture the dialog that solved tough designs anddiscussions to retain team knowledge. All information is kept in a managed, easy to search,and auditable system.

• Cross team collaboration — Allow teams beyond engineering to easily add their owncontent to the overall product knowledge. This provides the ability to classify thenon-engineering data in the same classification system alongside the engineering data, or inits own libraries using a bookshelf and document organization.

• Automatic notifications — Enable users to subscribe to standard notifications, contentowners to send push notifications, and administrators to customize system notifications bycompany.

• Secure access — Allow workspace leads to set default access definition for the workspace,including folders and subfolders. Assign granular access for specific content. Administratorscan assign company specific vaults and file stores.

Enhanced products in 10.8

This release of ENOVIA MatrixOne includes 31 enhanced products.

ENOVIA Collaborative Design for CATIA V5 — (5672-CT5)

Supported CATAnalysisComputation files

Extends the support of a CATAnalysis file to also be associated as a related document.CATAnalysis computation files are also recognized and associated upon check in of the CATIAdata set.

Ability to manage and leverage CATIA graphical representation (CGR) file for loading invisualization mode

A CGR file is a light representation of 3D geometry. A CGR is useful for viewing purposesbecause it is quicker and easier to load. However, a user can not modify a CGR file's geometry.

CATIA load time for large data sets is improved significantly by loading CGR files when an itemis not selected for lock, which implies intent to modify. At load time, the following occurs:

• CGR derived output is automatically extracted from the file store when performing checkout onthe associated CATPart.

• The CGR is automatically placed in a CATIA cache to be used by CATIA when loading data invisualization mode.

Digital Mock-up (DMU) check in/check out

Users can check-out directly from interference objects, which have been created as part of aninterference check, from within ENOVIA Designer Central. The CATIA graphical representation


(CGR) objects are loaded into the DMU V5 session. Changes can be made, and then checkedback through the ENOVIA Collaborative Design for CATIA V5.

ENOVIA Adaplet Development Kit — System License (5674-ADT)

Web service adaplets are enhanced to support file handling from foreign data. This includes theability to transfer files to and from a foreign non-ENOVIA MatrixOne system. This capability isalready available using adaplets with direct database connection.

ENOVIA File Collaboration Server — System License (5674-FCS)

The ENOVIA File Collaboration Server (FCS) now supports file download and upload triggers.This enables custom code to manipulate the file content as the file data moves to and from theFCS. With this capability, implementers can satisfy various user cases based on customerrequirements. As an example, administrators can address digital rights management (DRM)requirements by encrypting the file data as it is transferred to the user for decryption by thebrowser, or decrypt the file content as it is being stored at the FCS server. Other requirementssuch as virus checking and watermarking can also be performed.

ENOVIA Collaboration Platform for Development and Test — System License (5674-DTE)

ENOVIA Collaboration Platform for Development and Test has no unique product capabilities.Each DTE license provides the right to install and use one non-production copy of the productionENOVIA MatrixOne environment, including ENOVIA Collaboration Platform instances and all theother licensed ENOVIA products, for non-production purposes such as configuration, customdevelopment, testing, validation, and education.

For example, to establish a master development environment and two sandbox environments,three licensed units must be purchased.

ENOVIA Collaboration Platform for Development and Test now requires software license keys.Refer to the License Key Management section for additional details.

ENOVIA Advanced Search for Autonomy IDOL K2 — Named User (5672-AK2)

The ENOVIA Advanced Search for Autonomy IDOL K2 is now supports the latest autonomysearch product release based on IDOL 7 technology.

ENOVIA Collaboration for Microsoft — Named User (5672-MSF)

• Includes supported on Windows Vista provided with Windows XP

• Runs on the Microsoft Office 2007 suite of tools (Microsoft Word, Excel, PowerPoint, andOutlook)

• Works with Microsoft Office 2007's new ribbon toolbar and improves usability with fewer clicksversus using the traditional pull-down menus

• Is compatible with the following version of MS Project:

– MS Project 2003

– MS Project 2007

ENOVIA Designer Central — Named User (5672-DEC)

CATIA graphical representation (CGR) file management support

A CGR file is a light representation of a CATIA 3D file that results in a smaller file size than theCATPart file. A CGR format file is useful for viewing purposes because it is quicker and easier toload. However, you can not modify geometry in a CGR file since it is only for 3D viewing.

ENOVIA Designer Central manages the automated storage and retrieval of CGR files as derivedoutput from ENOVIA Collaborative Design for CATIA V5, ENOVIA Collaborative Design forPro/ENGINEER, ENOVIA Collaborative Design for UGS NX, and ENOVIA Collaborative Designfor SolidWorks. These files may be used in the Dassault Systemes 3D XML Player, 3DLive, andENOVIA Collaborative Interference Management products.

Performance improvements

Users will experience significant performance improvements during check in/check out, save-as,and promotion capabilities as well as overall increases in all pages that display and refresh CADstructures.

During check in, users will benefit from an overall increase in performance in the range of25-40%. Check-out gains in the range of 20-40% will also be exhibited. For check-out, the larger


the structure, the more dramatic the benefit will be. Users will experience gains of 55-80% inpages that require display and refresh of CAD structures. Along with the check in/check outpages, other pages of note that benefit are save-as and promote.


Administration of AutoVue keys has is greatly simplified.

Cimmetry AutoVue 19.2 viewer is included at no extra cost in ENOVIA Designer Central (DEC)for file viewing, and requires a Cimmetry license key.

The use of these license keys removes expiration dates and enforced limits on the number ofseats/users. However, the number of AutoVue Web Edition seats you are entitled to is still equalto the number of named-users of ENOVIA Designer Central purchased.

The license keys and installation instructions are available from Oracle online at

http://licensecodes.oracle.com/cimmetry.html

ENOVIA Designer Central for Visualization — Named User (5672-DEV)

User experience improvements

Users will experience significant performance improvements during check in/check out,"save-as" and promotion functions due to modifications of techniques for data transfer anddisplay rendering. These improvements are more prevalent with larger structures — the largerthe structure the better the performance gains.

Users will also notice dramatic performance differences on pages that request the display ofCAD structures. The new techniques allow for quick initial display and much faster refresh of thetables.


Administration of AutoVue keys is greatly simplified.

Cimmetry AutoVue 19.2 viewer is included at no extra cost in ENOVIA Designer Central forVisualization (DEV) for file viewing, and requires a Cimmetry license key.

The use of these license keys removes expiration dates and enforced limits on the number ofseats/users. However, the number of AutoVue Web Edition seats you are entitled to is still equalto the number of named-users of ENOVIA Designer Central that you have purchased.



ENOVIA Collaborative Design for AutoCAD — Named User (5672-AAD)

• Auto-recognition of design files

One of the challenges in today's global development environment is the sharing of files withexternal resources that are not ENOVIA MatrixOne users. Once a file is checked out, it ispossible for the file to be moved to other locations outside of the normal ENOVIA MatrixOneprocesses. In order to retain proper security and data integrity when the files are returned tothe ENOVIA MatrixOne system there must be a mechanism with which to distinguish whatdesign object the file belongs to. ENOVIA Collaborative Design for AutoCAD delivers such amechanism so when users check in a file it is automatically recognized and associated to thecorrect revision/version stream and managed appropriately.

• Product structure data integrity — The combination of ENOVIA Collaborative Design forAutoCAD and ENOVIA Designer Central provides a powerful solution in maintaining theintegrity and timeliness of AutoCAD data in the PLM system.

ENOVIA Collaborative Design for AutoCAD controls the relationships between AutoCADentities and how they are presented in the database. When a drawing is created it becomesthe parent by the very nature of the internal reference to the part. Another example is when astructure is being checked out for loading in the CAD application. ENOVIA CollaborativeDesign for AutoCAD controls what must be checked out for proper assembly in the CADapplication while ENOVIA Designer Central capabilities provide the user interface andbusiness process accesses for the operation to be performed. When files are checked out,data integrity issues may occur prior to checking the file back in to ENOVIA. ENOVIACollaborative Design for AutoCAD provides an auto-recognition capability that gives the user




confidence that on check in the file will be associated with the proper revision/version streamin from which it was checked out. Another aspect of maintaining data integrity is thesynchronization between the CAD designs and the objects stored in ENOVIA.

• Supported software versions

AutoCAD and AutoCAD Mechanical 2008 are now supported in addition to AutoCAD andAutoCAD Mechanical 2007, AutoCAD and AutoCAD Mechanical 2005 and AutoCAD andAutoCAD Mechanical 2006, which were supported in the previous release.

ENOVIA Collaborative Design for Inventor — Named User (5672-INV)

• Auto-recognition of design files

One of the challenges in today's global development environment is the sharing of files withexternal resources that are not ENOVIA MatrixOne users. Once a file is checked out it ispossible for the file to be moved to other locations outside of the normal ENOVIA MatrixOneprocesses. In order to retain proper security and data integrity when the files are returned tothe ENOVIA MatrixOne system there must be a mechanism with which to distinguish whatdesign object the file belongs to. ENOVIA Collaborative Design for Inventor provides such amechanism so when users check in a file it is automatically recognized and associated to thecorrect revision/version stream and managed appropriately.

• iPart factory support

Many customers utilize the concept of configurations in their design process. The InventoriPart Factory allows users to utilize different configurations of a design in many differentpotential design variations. Collaborative Design for Inventor allows users to check in/checkout different iPart Factory designs. It provides revision and version control.

• Product structure data integrity — The combination of ENOVIA Collaborative Design forInventor and ENOVIA Designer Central provides a powerful solution in maintaining theintegrity and timeliness of Inventor data in the PLM system.

ENOVIA Collaborative Design for Inventor controls the relationships between Inventor entitiesand how they are presented in the database. When a drawing is created it becomes theparent by the very nature of the internal reference to the part. Another example is when astructure is being checked out for loading in the CAD application. ENOVIA CollaborativeDesign for Inventor controls what must be checked out for proper assembly in the CADapplication while ENOVIA Designer Central capabilities provide the user interface andbusiness process accesses for the operation to be performed.

When files are checked out, data integrity issues may occur prior to checking the file back in toENOVIA. ENOVIA Collaborative Design for Inventor provides an auto-recognition capabilitythat gives the user confidence that on check in the file will be associated with the properrevision/version stream in from which it was checked out. Another aspect of maintaining dataintegrity is the synchronization between the CAD designs and the objects stored in ENOVIA.

Supported software versions

Inventor version v2008 is a new supported release in addition to Inventor V10 and Inventor V11.

ENOVIA Collaborative Design for Pro/ENGINEER — Named User (5672-PRO)


ENOVIA Collaborative Design for Pro/ENGINEER generates CGR formatted files, which are alight representation of 3D geometry. A CGR file is useful for viewing purposes because it isquicker and easier to load. However, a user can not modify a CGR file's geometry.

CGR file generation may be set as a background process or with the check-in transaction, andare stored as derived output objects associated with the CAD design model. These files may beused in the Dassault Systemes 3D XML Player, 3DLive, and ENOVIA Collaborative InterferenceManagement products.

ENOVIA Collaborative Design for SolidWorks — Named User (5672-SLW)


ENOVIA Collaborative Design for SolidWorks generates CGR formatted files during a check-inoperation. A CGR file is a light representation of 3D geometry, and is useful for viewing purposesbecause it is quicker and easier to load. However, a user can not modify a CGR file's geometry.


These files are stored as derived output objects associated with the CAD design model. Thesefiles may now be used in the Dassault Systemes 3D XML Player, 3DLive, and ENOVIACollaborative Interference Management products.

ENOVIA Collaborative Design for UGS NX — Named User (5672-UGR)


ENOVIA Collaborative Design for UGS NX generates CGR formatted files, which are a lightrepresentation of 3D geometry. A CGR file is useful for viewing purposes because it is quickerand easier to load. However, a user can not modify a CGR file's geometry.

CGR file generation may be set as a background process or with the check-in transaction, andare stored as derived output objects associated with the CAD design model. These files may beused in the Dassault Systemes 3D XML Player, 3DLive, and ENOVIA Collaborative InterferenceManagement products.

Qualification on latest vendor platform

ENOVIA Collaborative Design for Cadence Project Manager — Named User (5672-CDM)now supports Cadence SPB 15.5, 15.7, and 16.0.

ENOVIA Collaborative Design for Cadence Allegro Design Entry HDL — Named User(5672-CDH) now supports Cadence SPB 15.5, 15.7, and 16.0.

ENOVIA Collaborative Design for Cadence Allegro PCB Editor — Named User (5672-CDP)now supports Cadence SPB 15.5, 15.7, and 16.0.

ENOVIA Collaborative Design for Mentor Graphics Design Manager — Named User(5672-MGM) now supports Mentor Graphics BSXE2005 and BSXE2006.

ENOVIA Collaborative Design for Mentor Graphics Expedition — Named User (5672-VEB)now supports Mentor Graphics EXP2005.05 and EXP2005 SPac1.

ENOVIA Collaborative Design for Zuken CR-5000 System Designer — Named User(5672-ZSD) now supports Zuken CR-5000 v.8.0.

ENOVIA Collaborative Design for Zuken CR-5000 Board Designer — Named User(5672-ZBD) now supports Zuken CR-5000 v.8.0.

ENOVIA Collaborative Design for Zuken CR-5000 Board Producer — Named User(5672-ZBP) now supports Zuken CR-5000 v.8.0.

ENOVIA Collaborative 2D Viewing with AutoVue Professional — Named User (5672-C2D)



Cimmetry AutoVue 19.2 viewer is included at no extra cost in ENOVIA Collaborative 2D Viewingwith AutoVue Professional (C2D) for file viewing, and requires a Cimmetry license key.

The use of these license keys removes expiration dates and enforced limits on the number ofseats/users. However, the number of AutoVue Web Edition seats you are entitled to is still equalto the number of named-users of ENOVIA Collaborative 2D Viewing with AutoVue Professionalthat you have purchased.



ENOVIA Collaborative 3D Viewing with AutoVue Professional — Named User (5672-C3D)



Cimmetry AutoVue 19.2 viewer is included at no extra cost in ENOVIA Collaborative 3D Viewingwith AutoVue Professional (C3D) for file viewing, and requires a Cimmetry license key.

The use of these license keys removes expiration dates and enforced limits on the number ofseats/users. However, the number of AutoVue Web Edition seats you are entitled to is still equalto the number of named-users of ENOVIA Collaborative 3D Viewing with AutoVue Professionalthat you have purchased.





ENOVIA Program Central — Named User (5672-PRG)

Master project scheduling

Provides a company with the ability to improve the management of large and complex productdevelopment projects while improving management oversight. This capability:

• Decomposes a master project work breakdown structure into smaller sub-projects for greatercontrol and more-focused project teams

• Defines task dependencies between multiple projects

Automated task assignments

Pre-configures role assignments for each process activity through project templates. Project taskassignments can be aligned with functional capabilities:

• Tasks can be configured in the work breakdown structure (WBS) of project templates to definewhich project role a member should have in order to be assigned a particular task. During theassignment by role process, the system automatically maps tasks to project members basedon the role assigned to the task. Then, the project leader can designate the task owner andthe assignees, along with the allotted time.

• As project membership changes during the life cycle of a project, a project leader can easilyreassign tasks (WBS Tasks, Risks, and Issues) from one member to another in a batchprocess.

Extended program central configurability

• Adds data display configurability to 17 tables and 37 create/edit forms without compromisingupgrades

• Leverages common toolbar menus and components for data comparison, filtering, export, andso on

ENOVIA Program Management for VPM V5 — Named User (5672-VPR) — Check in andcheck out documents between ENOVIA Program Central and ENOVIA VPM V5.

ENOVIA X-BOM Cost Analytics — Named User (5672-CST)

• Logical expressions in formulas — Handles complex/conditional cost calculations

• User-defined cost types — Adds flexibility for customers to define their own cost types andperform calculations based on these cost types

ENOVIA X-BOM for JD Edwards EnterpriseOne — System License (5674-JDE)

Supports the bi-directional transfer of information between ENOVIA X-BOM manufacturing andJD Edwards EnterpriseOne that enables companies to reduce the cost of developing andmaintaining complex individual integrations. This is accomplished through the synchronization ofEBOM and MBOM data on a single PLM definition (ENOVIA XBOM for manufacturing), andprovides a robust real-time bi-directional sharing of information between the PLM database andJD Edwards EnterpriseOne. ENOVIA X-BOM for JD Edwards EnterpriseOne provides theconnector for sharing plant-specific BOMs.

• Promotes early visibility of new and proposed part changes at the appropriate plant location

• Executes MBOM comparisons from ENOVIA MatrixOne, and updates the ERP plant-specificBOM with modifications only

ENOVIA X-BOM for Oracle Manufacturing — System License (5674-ORM)

Supports the bi-directional transfer of information between ENOVIA X-BOM manufacturing andOracle Manufacturing that enables companies to reduce the cost of developing and maintainingcomplex individual integrations. This is accomplished through the synchronization of EBOM andMBOM data on a single PLM definition (ENOVIA XBOM for manufacturing), and provides arobust real-time bi-directional sharing of information between the PLM database and OracleManufacturing. ENOVIA X-BOM for Oracle Manufacturing provides the connector for sharingplant-specific BOMs.





ENOVIA X-BOM for QAD MFG/PRO — System License (5674-QAM)

Supports the bi-directional transfer of information between ENOVIA X-BOM manufacturing andQAD MFG/PRO that enables companies to reduce the cost of developing and maintainingcomplex individual integrations. This is accomplished through the synchronization of EBOM andMBOM data on a single PLM definition (ENOVIA XBOM for manufacturing), and provides arobust real-time bi-directional sharing of information between the PLM database and QADMFG/PRO. ENOVIA X-BOM for QAD MFG/PRO provides the connector for sharingplant-specific BOMs.



ENOVIA Apparel Accelerator for Design and Development — Named User (5672-APR)

Season and line planning: Seasonal libraries

• Increases design teams' ability to leverage non-seasonal library components within a specificseason

• Incorporates seasonal components into a library, or sub-library, specific to a brand anddivision

Product design and development: Product change implementation

Increases visibility and tracking of any changes made during the development process. Visualmark-ups quickly allow sourcing teams to identify changes and communicate with vendors.

Product design & development: BOM alternate sources

Enhances BOM capabilities for sourcing teams to quickly identify alternative sourcing optionsthat achieve the same garment quality and reduce total cost and increase margins.

Product and commercialization: Labor and operations

Defines the specific labor steps (cut, sew, and make) required to make a garment as required bygarment manufacturers. This leverages a new operations library to standardize product bill oflabor and definition.

ENOVIA Medical Device Accelerator for Regulatory Compliance — Named User(5672-MED)

Failure Mode Effects and Analysis (FMEA)

Helps a company comply with regulatory requirement FDA 21 CFR.820.30, Design Controls, toreduce product liability suits and improve product safety by identifying device hazards early inthe design process.

The new FMEA capabilities include:

• Defining the FMEA at the device and part level. With each FMEA, identify the severity (1-10),occurrence (1-10), and detection (1-10) to determine the Risk Priority Number (RPN)

• Mitigating a high priority FMEA by assigning ownership, action items, and a target completiondate

• Tracking the actual actions and dates to complete FMEAs

Prerequisites per product matrix

Prerequisites per product

CDH CPF* DEC ENG LIB MGM PRD PRG SUP SYN VEB


AAD -- -- X -- -- -- -- -- -- -- --ADI* -- X -- -- -- -- -- -- -- -- --ADT -- X -- -- -- -- -- -- -- -- --ADV -- X -- -- -- -- -- -- -- -- --AER -- -- -- -- -- -- X X -- -- --AK2 -- X -- -- -- -- -- -- -- -- --APR -- -- -- -- -- -- X X -- -- --AUT -- -- -- -- -- -- -- X X -- --C2D -- X -- -- -- -- -- -- -- -- --C3D -- X -- -- -- -- -- -- -- -- --CDH -- -- X -- -- -- -- -- -- -- --CDM -- -- X -- -- -- -- -- -- -- --CDP -- -- X -- -- -- -- -- -- -- --CLC -- -- -- X -- -- -- -- -- -- --CPF* -- -- -- -- -- -- -- -- -- -- --CPW* -- X -- -- -- -- -- -- -- -- --CST -- -- -- X -- -- -- -- -- -- --CT4 -- -- X -- -- -- -- -- -- -- --CT5 -- -- X -- -- -- -- -- -- -- --DEC -- X -- -- -- -- -- -- -- -- --DEV -- X -- -- -- -- -- -- -- -- --DTE -- X -- -- -- -- -- -- -- -- --ENG -- X -- -- -- -- -- -- -- -- --FCS -- X -- -- -- -- -- -- -- -- --IMC* -- X -- -- -- -- -- -- -- -- --INV -- -- X -- -- -- -- -- -- -- --JDD -- -- -- X -- -- -- -- -- -- --JDE -- -- -- X -- -- -- -- -- -- --LCA X -- -- -- -- -- -- -- -- -- --LIB -- X -- -- -- -- -- -- -- -- --LMA -- -- -- -- -- X -- -- -- -- --LME -- -- -- -- -- -- -- -- -- -- XMCC -- X -- -- -- -- -- -- -- -- --MCN -- -- -- -- -- -- -- -- -- -- --MCR -- -- X -- -- -- -- -- -- -- --MED -- -- -- X -- -- -- X -- -- --MFG -- -- -- X -- -- -- -- -- -- --MGM -- -- X -- -- -- -- -- -- -- --MSF -- X -- -- -- -- -- -- -- -- --MSU -- -- -- -- -- -- -- -- -- -- --ORM -- -- -- X -- -- -- -- -- -- --PRD -- X -- -- -- -- -- -- -- -- --PRG -- X -- -- -- -- -- -- -- -- --PRI -- -- X -- -- -- -- -- -- -- --PRO -- -- X -- -- -- -- -- -- -- --QAM -- -- -- X -- -- -- -- -- -- --SAM -- -- -- X -- -- -- -- -- -- --SCC* -- X -- -- -- -- -- -- -- -- --SCH* -- X -- -- -- -- -- -- -- -- --SDM* -- -- -- X -- -- X -- -- -- --SEP* -- -- -- -- -- -- -- X -- -- --SIP* -- -- -- -- X -- -- -- -- -- --SLE -- -- X -- -- -- -- -- -- -- --SLW -- -- X -- -- -- -- -- -- -- --SPC -- X -- -- -- -- -- -- -- -- --SRC -- X -- -- -- -- -- -- -- -- --SUP -- X -- -- -- -- -- -- -- -- --UGR -- -- X -- -- -- -- -- -- -- --VEB -- -- X -- -- -- -- -- -- -- --VPR -- -- -- -- -- -- -- X -- -- --VXB -- -- -- X -- -- -- -- -- -- --ZBD -- -- X -- -- -- -- -- -- -- --ZBP -- -- X -- -- -- -- -- -- -- --ZSD -- -- X -- -- -- -- -- -- -- --

* New product in M1 10.8

ENOVIA MatrixOne 10.8 product configuration matrix

Product Configuration Matrix* * *

APR AER AUT ENG LIB MED MSF PRD PRG SDM SEP SIP SRC SUP VPR VXB


AES -- X -- -- -- -- X X X -- -- -- -- -- -- --ARS X -- -- -- -- -- -- X X -- -- -- -- -- -- --AUS -- -- X -- -- -- -- -- X -- -- -- -- X -- --GCS -- -- -- -- -- -- -- -- -- -- -- -- X X -- --MRS -- -- -- X -- X -- -- X -- -- -- -- -- -- --SDS -- -- -- X -- -- -- X -- X -- -- -- -- -- --SIS -- -- -- -- X -- -- -- -- -- -- X -- -- -- --SPS -- -- -- -- -- -- -- -- X -- X -- -- -- -- --VPG -- -- -- -- -- -- -- -- X -- -- -- -- -- X --VXS -- -- -- X -- -- -- -- -- -- -- -- -- -- -- X=====================================================================

* New product in M1 10.8

Technical information

Specified operating environment

Hardware requirements: In this release the hardware and software requirements are combined.

Release supported minimal hardware and software requirements: To run ENOVIAMatrixOne software, a customer must install at least one database server and one file server.The typical implementation has a single centralized database server. However, in rare cases, acustomer may choose to distribute their implementation across multiple database servers. Foreach database server, the customer needs to install the ENOVIA Collaboration Platform and aWeb application server in order to handle end-user requests from their Web browsers, which areused to run most ENOVIA MatrixOne products for end-users.

Whether the database is centralized or distributed, customers typically install multiple file serversin order to manage file content as close to end users as possible. For each file server, theENOVIA File Collaboration Server and a Web application server is needed. In some cases, acustomer can choose to have their database server and file server be on the same machine anduse the existing ENOVIA Collaboration Platform and Web application server software installedfor the database to handle all file management requests.

For each release, ENOVIA MatrixOne supports different combinations of database, Webapplication server, and Web browser products.

Supported platforms for ENOVIA MatrixOne 10.8:

Notes

• All application servers, Java Development Kit (JDK) versions, and browsers must be 32-bit,because ENOVIA MatrixOne is a 32-bit application.

• Download Mozilla for AIX and HP-UX from IBM and HP Web sites.

• WebLogic and WebSphere® support also includes the Express version.

• ENOVIA Collaboration Platform is supported on Windows Vista and XP as client-only.

• Oracle 10g database support includes the Enterprise, Standard, and Standard One editions;Oracle Real Application Clusters (RAC) are not supported.

• SQL Server 2005 editions include Enterprise and Standard.

• MySQL Enterprise 5.0 (latest 5.0 release) is supported; MySQL Connector/ODBC 3.51 (latest3.51.x) version is also required on all clients. For Red Hat Enterprise Linux (RHEL),unixODBC must be installed.

Solaris 10 (SPARC & Opteron x86)

Category Vendor Product Supported

App Serv BEA WebLogic 10/JDK 1.5 XApp Serv IBM WebSphere 6.1.0.11/JDK 1.5 XApp Serv Open Source Tomcat 6.0.14/JDK 1.5 X


App Serv Sun Java System 9.0 Update 1/JDK 1.5 XBrowser Microsoft Internet Explorer 6 SP1/JRE 1.6Browser Microsoft Internet Explorer 7/JRE 1.6Browser Open Source Firefox 2.0.x/JRE 1.6 XBrowser Open Source Mozilla 1.7.x/JRE 1.5Database Oracle Oracle 10g R2 (10.2.0.3) XDatabase IBM DB2 9.1 FP4Database MySQL AB MySQL Enterprise 5.0Database Microsoft SQL Server 2005 SP2

JDK for Solaris

• WebSphere V6.1.0.11, including bundled JDK

• WebLogic 10, including bundled Sun JDK

• Tomcat 6.0.14, with Sun JDK 5 update 13, or higher

• Sun Java System 9.0 update 1, with JDK 5 update

HP-UX 11i (PA-RISC)


App Serv BEA WebLogic 10/JDK 1.5 XApp Serv IBM WebSphere 6.1.0.11/JDK 1.5App Serv Open Source Tomcat 6.0.14/JDK 1.5 XApp Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6Browser Microsoft Internet Explorer 7/JRE 1.6Browser Open Source Firefox 2.0.x/JRE 1.6Browser Open Source Mozilla 1.7.x/JRE 1.5 XDatabase Oracle Oracle 10g R2 (10.2.0.3) XDatabase IBM DB2 9.1 FP4Database MySQL AB MySQL Enterprise 5.0Database Microsoft SQL Server 2005 SP2

JDK for HP-UX

• WebLogic V10, including bundled HP JDK

• Tomcat 6.0.14, with JDK 5.0.10 (HP)

AIX 5.3 TL05-03+ (Power 4 & 5)


App Serv BEA WebLogic 10/JDK 1.5 XApp Serv IBM WebSphere 6.1.0.11/JDK 1.5 XApp Serv Open Source Tomcat 6.0.14/JDK 1.5 XApp Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6Browser Microsoft Internet Explorer 7/JRE 1.6Browser Open Source Firefox 2.0.x/JRE 1.6Browser Open Source Mozilla 1.7.x/JRE 1.5 XDatabase Oracle Oracle 10g R2 (10.2.0.3) XDatabase IBM DB2 9.1 FP4 XDatabase MySQL AB MySQL Enterprise 5.0Database Microsoft SQL Server 2005 SP2

JDK for AIX


• WebLogic V10, with Java 5 SR6 (IBM)

• Tomcat 6.0.14, with Java 5 SR6 (IBM)

Windows Server 2003 SP2 (x86)



App Serv BEA WebLogic 10/JDK 1.5 XApp Serv IBM WebSphere 6.1.0.11/JDK 1.5 XApp Serv Open Source Tomcat 6.0.14/JDK 1.5 XApp Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6 XBrowser Microsoft Internet Explorer 7/JRE 1.6 XBrowser Open Source Firefox 2.0.x/JRE 1.6 XBrowser Open Source Mozilla 1.7.x/JRE 1.5Database Oracle Oracle 10g R2 (10.2.0.3) XDatabase IBM DB2 9.1 FP4 XDatabase MySQL AB MySQL Enterprise 5.0 XDatabase Microsoft SQL Server 2005 SP2 X

JDK for Windows


• WebLogic V10, including bundled Sun JDK

• Tomcat 6.0.14, with Sun JDK 5 update 13 or higher

Red Hat Enterprise Linux 5 (x86)


App Serv BEA WebLogic 10/JDK 1.5App Serv IBM WebSphere 6.1.0.11/JDK 1.5App Serv Open Source Tomcat 6.0.14/JDK 1.5 XApp Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6Browser Microsoft Internet Explorer 7/JRE 1.6Browser Open Source Firefox 2.0.x/JRE 1.6 XBrowser Open Source Mozilla 1.7.x/JRE 1.5Database Oracle Oracle 10g R2 (10.2.0.3) XDatabase IBM DB2 9.1 FP4Database MySQL AB MySQL Enterprise 5.0 XDatabase Microsoft SQL Server 2005 SP2

JDK for Red Hat Linux: Tomcat 6.0.14, with Sun JDK 5 update 13, or higher

Windows Vista (x86)


App Serv BEA WebLogic 10/JDK 1.5App Serv IBM WebSphere 6.1.0.11/JDK 1.5App Serv Open Source Tomcat 6.0.14/JDK 1.5App Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6 XBrowser Microsoft Internet Explorer 7/JRE 1.6 XBrowser Open Source Firefox 2.0.x/JRE 1.6 XBrowser Open Source Mozilla 1.7.x/JRE 1.5Database Oracle Oracle 10g R2 (10.2.0.3)Database IBM DB2 9.1 FP4Database MySQL AB MySQL Enterprise 5.0Database Microsoft SQL Server 2005 SP2

JDK for Windows



• Tomcat 6.0.14, with Sun JDK 5 update 13 or higher

Windows XP SP2 (x86)



App Serv BEA WebLogic 10/JDK 1.5App Serv IBM WebSphere 6.1.0.11/JDK 1.5App Serv Open Source Tomcat 6.0.14/JDK 1.5App Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6 XBrowser Microsoft Internet Explorer 7/JRE 1.6 XBrowser Open Source Firefox 2.0.x/JRE 1.6 XBrowser Open Source Mozilla 1.7.x/JRE 1.5Database Oracle Oracle 10g R2 (10.2.0.3)Database IBM DB2 9.1 FP4Database MySQL AB MySQL Enterprise 5.0Database Microsoft SQL Server 2005 SP2

JDK for Windows



• Tomcat 6.0.14, with Sun JDK 5 update 13, or higher

Macintosh


App Serv BEA WebLogic 10/JDK 1.5App Serv IBM WebSphere 6.1.0.11/JDK 1.5App Serv Open Source Tomcat 6.0.14/JDK 1.5App Serv Sun Java System 9.0 Update 1/JDK 1.5Browser Microsoft Internet Explorer 6 SP1/JRE 1.6Browser Microsoft Internet Explorer 7/JRE 1.6Browser Open Source Firefox 2.0.x/JRE 1.6 JRE 1.5Browser Open Source Mozilla 1.7.x/JRE 1.5Database Oracle Oracle 10g R2 (10.2.0.3)Database IBM DB2 9.1 FP4Database MySQL AB MySQL Enterprise 5.0Database Microsoft SQL Server 2005 SP2

Optional corequisites: In order to use the DesignSync functionality of the following products,the corequisite product, ENOVIA Synchronicity DesignSync, is required:

• ENOVIA Semiconductor Accelerator for Enterprise Project Management — Named User(5672-SEP)

• ENOVIA Semiconductor Accelerator for IP Management — Named User (5672-SIP)

• ENOVIA Semiconductor Accelerator for Team Collaboration — Named User (5672-SCC)

ENOVIA Synchronicity DesignSync is currently not an IBM offering.

Documentation

ENOVIA MatrixOne product documentation is delivered with the product in a viewablemulti-volume format, with a built-in search engine. Documentation includes:

• ENOVIA MatrixOne

• Matrix Query Language (MQL)

• Business Modeler

• System Manager

• Basics, Programming Guide

• Application Development Guide

• Installation Guide

• Release Bulletin

License Key Management: Some product functions require license keys. These keys must berequested from the IBM Key Center. Customers will be provided instructions to obtain license


keys with the product.

Specific license keys

The following products require an IBM License Use Management (LUM) software license key:

• ENOVIA Collaboration Platform (CPF)

A new license control mechanism is introduced for ENOVIA Collaboration Platformdeployments. One LUM V4 Nodelocked key is required on each application server host. Evenif more that one instance of the application server is running on that host, only one key isrequired.

A hardware identification number called the "target ID" (usually based on the MAC address ofone of the NIC cards in the machine) is contained in the key.

No LUM key is required for ENOVIA Collaboration Platform (CPF) servers running on Solarison x86 hardware, nor on Linux.

• ENOVIA Collaboration Platform for Development and Test (DTE)

Each application server host used for ENOVIA Collaboration Platform for Development andTest (DTE) requires the same ENOVIA Collaboration Platform (CPF) LUM key type describedin the ENOVIA Collaboration Platform (CPF) section; there is not an unique key type forENOVIA Collaboration Platform for Development and Test (DTE).

• ENOVIA Collaborative Design for CATIA V5 (CT5)

ENOVIA Collaborative Design for CATIA V5 requires a CT5 license key for every named user.If a "Nodelock" license key is ordered, the key is installed on the LUM folder of the CATIA V5machine. If a "network" (in LUM terms, Concurrent) key is ordered, the key is installed on theLUM server accessed by CATIA V5. Both procedures are identical to the ones used forstandard CATIA V5 license key management.

For detailed instructions on ordering a license key, refer to the Customer Registration Memo.

The number of keys required in special circumstances, such as running macros or batchprocesses on a CATIA machine, is described in detail in the CATIA announcement letter andproduct documentation.

Dynamic licensing is not supported.

Note: Although CATIA V4 is LUM enabled, ENOVIA CATIA V4 Integration (5672-CT4) doesnot require a LUM software key.

• Other products requiring a license key

The following products use Cimmetry AutoVue 19.2 for file viewing and require a Cimmetrylicense key:

– ENOVIA Designer Central (DEC)

– ENOVIA Designer Central for Visualization (DEV)

– ENOVIA Collaborative 2D Viewing with AutoVue Professional (C2D)

– ENOVIA Collaborative 3D Viewing with AutoVue Professional (C3D)



The use of these license keys removes expiration dates and enforced limits on the number ofseats/users. However, the number of AutoVue Web Edition seats you are entitled to is stillequal to the number of named-users of the ENOVIA MatrixOne products (DEC, DEV, C2D,and C3D) already purchased.

National language support: Most ENOVIA MatrixOne products can run in English, French,Italian, German, and Japanese. However, some newer products do not yet ship with all fivelanguages. Exceptions are listed here.

Prd Supported Languages

ADI* English Only



ADT English only (Programming toolkit)ADV English only (Programming toolkit)AER English onlyAK2 English onlyAUT English onlyC2D English, French, German, and JapaneseC3D English, French, German, and JapaneseCDH English onlyCDP English onlyCLC English onlyCPW* N/ACST English onlyCT4 English onlyFCS N/AIMC* English, French, German, and JapaneseJDD English onlyJDE English onlyLCA English onlyLMA English onlyLME English onlyMCN English onlyMED English onlyMGM English onlyMSU English onlyORM English onlyPRI English onlyPRO English and JapaneseQAM English onlySAM English, French, German, and ItalianSCH* English only (Programming toolkit)UGR English and JapaneseVEB English onlyVPR English onlyZBD English onlyZSD English only

* New product

Software requirements: Release supported software requirements

In this release the hardware and software requirements are combined, refer to the Releasesupported minimal hardware and software requirements section.

The latest hardware and software prerequisites and requirements information is available in theENOVIA MatrixOne 10.8 Program Directory. This information can also be found on the ProductLifecycle Management Support Web site at

http://www.ibm.com/software/applications/plm/support/

Planning information

Packaging

ENOVIA MatrixOne 10.8 packaging: Each shipment of ENOVIA MatrixOne 10.8 will include:

Delivered to all customers

ENOVIA Collaboration Platform (CPF) — Four CD-ROMs in a 4-CD plastic holder(LCD7-3606)

• CD 1: ENOVIA Collaboration Platform — Navigator and Administrative Clients

• CD 2: ENOVIA Collaboration Platform — Web Server

• CD 3: ENOVIA Collaboration Platform — Business Process Services

• CD 4: ENOVIA Collaboration Platform — English Documentation

Optional products — only delivered if ordered

ENOVIA Adaplet Development Kit (ADT) — One CD in a single jewelcase (LCD7-2716)



ENOVIA Collaboration Platform Application Development Kit (ADV) — One CD in a singlejewelcase (LCD7-2717)

ENOVIA Collaboration Platform Workgroup Architecture (CPW) — One CD-ROM in a singlejewelcase (LCD7-2718)

ENOVIA File Collaboration Server (FCS) — One CD-ROM in a single jewelcase (LCD7-2719)

ENOVIA Schema Analyzer (SCH) — One CD-ROM in a single jewelcase (LCD7-2720)

ENOVIA Library Central (LIB) — One CD-ROM in a single jewelcase (LCD7-2721)

ENOVIA Collaboration for Adobe Illustrator (ADI) — One CD-ROM in a single jewelcase(LCD7-2722)

ENOVIA Advanced Search for Autonomy IDOL K2 (AK2) — One CD-ROM in a singlejewelcase (LCD7-2723)

ENOVIA Collaboration for Microsoft (MSF) — One CD-ROM in a single jewelcase(LCD7-2724)

ENOVIA Collaborative 2D & 3D Viewing with AutoVue Professional (C2D & C3D) — TwoCD-ROMs in a double-jewelcase (LCD7-2725)

ENOVIA Collaborative Interference Management (IMC) — One CD-ROM in a singlejewelcase (LCD7-2726)

ENOVIA Engineering Central (ENG) — One CD-ROM in a single jewelcase (LCD7-2727)

ENOVIA Specification Central (SPC) — One CD-ROM in a single jewelcase (LCD7-2728)

ENOVIA X-BOM for Rational® ClearCase® (CLC) — One CD-ROM in a single jewelcase(LCD7-2729)

ENOVIA X-BOM Cost Analytics (CST) — One CD-ROM in a single jewelcase (LCD7-2730)

ENOVIA X-BOM Manufacturing (MFG) — One CD-ROM in a single jewelcase (LCD7-2731)

ENOVIA X-BOM for VPM V5 (VXB) — One CD-ROM in a single jewelcase (LCD7-2732)

ENOVIA ERP Integration

• Five CD-ROMs in a 5-CD plastic holder (LCD7-2733)

– CD 1: ENOVIA X-BOM for JD Edwards World (JDD)

– CD 2: ENOVIA X-BOM for JD Edwards EnterpriseOne (JDE)

– CD 3: ENOVIA X-BOM for Oracle Manufacturing (ORM)

– CD 4: ENOVIA X-BOM for QAD MFG/PRO (QAM)

– CD 5: ENOVIA X-BOM for SAP (SAM)

ENOVIA Materials Compliance Central (MCC) — One CD-ROM in a single jewelcase(LCD7-2734)

ENOVIA Materials Compliance Connect (MCN) — One CD-ROM in a single jewelcase(LCD7-2735)

ENOVIA Materials Compliance Supplier Portal (MSU) — One CD-ROM in a single jewelcase(LCD7-2736)

ENOVIA Program Central (PRG) — One CD-ROM in a single jewelcase (LCD7-2737)

ENOVIA Product Central (PRD) — One CD-ROM in a single jewelcase (LCD7-2738)

ENOVIA Program Management for VPM V5 (VPR) — One CD-ROM in a single jewelcase(LCD7-2739)

ENOVIA Sourcing Central (SRC) — One CD-ROM in a single jewelcase (LCD7-2740)

ENOVIA Supplier Central (SUP) — One CD-ROM in a single jewelcase (LCD7-2741)

ENOVIA Designer Central and ENOVIA Designer Central for Visualization — TwoCD-ROMs in a double-jewelcase (LCD7-2742)

• CD 1: ENOVIA Designer Central (DEC)


• CD 2: ENOVIA Designer Central for Visualization (DEV)

ENOVIA MCAD — Nine CD-ROMs in a 10-CD plastic holder (LCD7-2743)

• CD 1: ENOVIA Collaborative Design for AutoCAD (AAD)

• CD 2: ENOVIA Collaborative Design for CATIA V4 (CT4)

• CD 3: ENOVIA Collaborative Design for Inventor (INV)

• CD 4: ENOVIA Collaborative Design for Microstation (MCR)

• CD 5: ENOVIA Collaborative Design for Pro/ENGINEER (PRO)

• CD 6: ENOVIA Collaborative Design for Pro/INTRALINK (PRI)

• CD 7: ENOVIA Collaborative Design for Solid Edge (SLE)

• CD 8: ENOVIA Collaborative Design for SolidWorks (SLW)

• CD 9: ENOVIA Collaborative Design for UGS NX (UGR)

ENOVIA Collaborative Design for CATIA V5 (CT5)

A customer purchasing ENOVIA Collaborative Design for CATIA V5 (CT5) will receive:

• MatrixOne CATIA V5 Integration (for CATIA V5.17) — Client — 4 CDs

• ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18 — Client — 6 CDs

• ENOVIA Collaborative Design for CATIA V5 Server (ENOVIA MatrixOne 10.8) — 1 CD

MatrixOne CATIA V5 Integration (for CATIA V5.17) — Four CD-ROMs in a quad-jewelcase(LCD7-2744)

• CD 1: MatrixOne CATIA V5 Integration (for CATIA V5.17) for AIX

• CD 2: MatrixOne CATIA V5 Integration (for CATIA V5.17) for HP-UX

• CD 3: MatrixOne CATIA V5.Integration (for CATIA V5.17) for Solaris

• CD 4: MatrixOne CATIA V5 Integration (for CATIA V5.17) for Windows

ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) — Six CD-ROMs in a 6-CDjewelcase (LCD7-2745)

• CD 1: ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) for AIX.

• CD 2: ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) for AIX 64-bit

• CD 3: ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) for HP-UX

• CD 4: ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) for Solaris

• CD 5: ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) for Windows.

• CD 6: ENOVIA Collaborative Design for CATIA V5 (for CATIA V5.18) for Windows 64-bit

ENOVIA Collaborative Design (ENOVIA MatrixOne 10.8) CATIA V5 Server — One CD-ROMin a single jewelcase (LCD7-2746)

ENOVIA ECAD — Eight CD-ROMs in an 8-CD plastic holder (LCD7-2747)

• CD 1: ENOVIA Collaborative Design for Cadence Project Manager (CDM)

• CD 2: ENOVIA Collaborative Design for Cadence Allegro Design Entry HDL (CDH)

• CD 3: ENOVIA Collaborative Design for Cadence Allegro PCB Editor (CDP)

• CD 4: ENOVIA Collaborative Design for Mentor Graphics Expedition (VEB)

• CD 5: ENOVIA Collaborative Design for Mentor Graphics Design Manager (MGM)

• CD 6: ENOVIA Collaborative Design for Zuken CD-5000 System Designer (ZSD)

• CD 7: ENOVIA Collaborative Design for Zuken CD-5000 Board Designer (ZBD)


• CD 8: ENOVIA Collaborative Design for Zuken CD-5000 Board Producer (ZBP)

ENOVIA Aerospace and Defense Accelerator for Program Management (AER) — OneCD-ROM in a single jewelcase (LCD7-2748)

ENOVIA Apparel Accelerator for Design and Development (APR) — One CD-ROM in asingle jewelcase (LCD7-2749)

ENOVIA Automotive Accelerator for APQP Program Management (AUT) — One CD-ROM ina single jewelcase (LCD7-2750)

ENOVIA Medical Device Accelerator for Regulatory Compliance (MED) — One CD-ROM ina single jewelcase (LCD7-3601)

ENOVIA Semiconductor Accelerator for Team Collaboration (SCC) — One CD-ROM in asingle jewelcase (LCD7-3602)

ENOVIA Semiconductor Accelerator for Design to Manufacturing (SDM) — One CD-ROM ina single jewelcase (LCD7-3603)

ENOVIA Semiconductor Accelerator for Enterprise Project Management (SEP) — OneCD-ROM in a single jewelcase (LCD7-3604)

ENOVIA Semiconductor Accelerator for IP Management (SIP) — One CD-ROM in a singlejewelcase (LCD7-3605)

ENOVIA Collaboration Platform for Development and Test (DTE) — Four CD-ROMs in a4-CD plastic holder (LCD7-3607)

• CD 1: ENOVIA Collaboration Platform for Development and Test — Navigator andAdministrative Clients

• CD 2: ENOVIA Collaboration Platform for Development and Test — Web Server

• CD 3: ENOVIA Collaboration Platform for Development and Test — Business ProcessServices.

• CD 4: ENOVIA Collaboration Platform for Development and Test — English Documentation

ENOVIA English Documentation One CD-ROM in a single jewelcase (SK4T—3625)

NLS Documentation

• ENOVIA French Documentation — One CD-ROM in a single jewelcase (SK4T—3626)

• ENOVIA German Documentation — One CD-ROM in a single jewelcase (SK4T—3627)

• ENOVIA Italian Documentation — One CD-ROM in a single jewelcase (SK4T—3628)

• ENOVIA Japanese Documentation — One CD-ROM in a single jewelcase (SK4T—3629)

Security, auditability, and control

The announced programs use the security and auditability features of the operating systemsoftware. The customer is responsible for evaluation, selection, and implementation of securityfeatures, administrative procedures, and appropriate controls in application systems andcommunication facilities.

Ordering information

Yearly license charge: This license charge is billed yearly in advance for the use of a licensedprogram. Customers who pay a yearly license charge for a licensed program receiveenhancements and future releases, if any, at no additional charge. A prorated credit will beissued for the unused portion of the yearly license charge in the event a licensed program isdiscontinued.

Process charge: The process charge for media has been withdrawn.

Current licensees

To obtain this new release contact your IBM sales representative.


New licensees

Orders for new licenses will be accepted now. For new licensees, shipment will begin on theplanned availability date.

New ENOVIA MatrixOne 10.8 products

Program Programnumber name

5672-ADI ENOVIA Collaboration for Adobe Illustrator - Named User5672-CPF ENOVIA Collaboration Platform - Named User5672-CPW ENOVIA Collaboration Platform Workgroup

Architecture - Named User5672-IMC ENOVIA Collaborative Interference Management - Named User5672-SCC ENOVIA Semiconductor Accelerator for Team

Collaboration - Named User5672-SDM ENOVIA Semiconductor Accelerator for Design to

Manufacture - Named User5672-SEP ENOVIA Semiconductor Accelerator for Enterprise Project

Management - Named User5672-SIP ENOVIA Semiconductor Accelerator for IP Management -

Named User5674-SCH ENOVIA Schema Analyzer - Development System License

Renamed products: ENOVIA MatrixOne 10.8 Configurations


5672-AES ENOVIA Aerospace and Defense Accelerator for ProgramManagement Solution - Named User**

5672-ARS ENOVIA Apparel Accelerator for Design and DevelopmentSolution - Named User**

5672-AUS ENOVIA Automotive Accelerator for APQP ProgramManagement Solution - Named User**

5672-GCS ENOVIA Global Supplier Collaboration Solution -Named User**

5672-MRS ENOVIA Medical Device Accelerator for RegulatoryCompliance Solution - Named User**

5672-SDS ENOVIA Semiconductor Accelerator for Design toManufacturing Solution - Named User**

5672-SIS ENOVIA Semiconductor Accelerator for IP ManagementSolution - Named User**

5672-SPS ENOVIA Semiconductor Accelerator for Enterprise ProjectManagement Solution - Named User**

5672-VPG ENOVIA Program Management for VPM V5 Solution -Named User**

5672-VXS ENOVIA X-BOM for VPM V5 Solution - Named User**

** Renamed product

ENOVIA MatrixOne 10.8 Named User products


5672-AAD ENOVIA Collaborative Design for AutoCAD - Named User**5672-AER ENOVIA Aerospace and Defense Accelerator for Program

Management - Named User**5672-AK2 ENOVIA Advanced Search for Autonomy IDOL K2 - Named

User**5672-APR ENOVIA Apparel Accelerator for Design and

Development - Named User**5672-AUT ENOVIA Automotive Accelerator for APQP Program

Management - Named User**5672-C2D ENOVIA Collaborative 2D Viewing with AutoVue

Professional - Named User**5672-C3D ENOVIA Collaborative 3D Viewing with AutoVue

Professional - Named User**5672-CDH ENOVIA Collaborative Design for Cadence Allegro

Design Entry HDL - Named User**5672-CDM ENOVIA Collaborative Design for Cadence Project


Manager - Named User**5672-CDP ENOVIA Collaborative Design for Cadence Allegro

PCB Editor - Named User**5672-CLC ENOVIA X-BOM for Rational ClearCase - Named User**5672-CST ENOVIA X-BOM Cost Analytics - Named User**5672-CT4 ENOVIA Collaborative Design for CATIA V4 - Named User**5672-CT5 ENOVIA Collaborative Design for CATIA V5 - Named User**5672-DEC ENOVIA Designer Central - Named User**5672-DEV ENOVIA Designer Central for Visualization - Named User**5672-ENG ENOVIA Engineering Central - Named User**5672-INV ENOVIA Collaborative Design for Inventor - Named User**5672-LIB ENOVIA Library Central - Named User**5672-MCC ENOVIA Materials Compliance Central - Named User**5672-MCR ENOVIA Collaborative Design for MicroStation - Named

User**5672-MED ENOVIA Medical Device Accelerator for Regulatory

Compliance - Named User**5672-MFG ENOVIA X-BOM Manufacturing - Named User**5672-MGM ENOVIA Collaborative Design for Mentor Graphics

Design Manager - Named User**5672-MSF ENOVIA Collaboration for Microsoft - Named User**5672-MSU ENOVIA Materials Compliance Supplier Portal - Named

User**5672-PRD ENOVIA Product Central - Named User**5672-PRG ENOVIA Program Central - Named User**5672-PRI ENOVIA Collaborative Design for Pro/INTRALINK - Named

User**5672-PRO ENOVIA Collaborative Design for Pro/ENGINEER - Named

User**5672-SLE ENOVIA Collaborative Design for Solid Edge - Named User**5672-SLW ENOVIA Collaborative Design for SolidWorks - Named User**5672-SPC ENOVIA Specification Central - Named User**5672-SRC ENOVIA Sourcing Central - Named User**5672-SUP ENOVIA Supplier Central - Named User**5672-UGR ENOVIA Collaborative Design for UGS NX - Named User**5672-VEB ENOVIA Collaborative Design for Mentor Graphics

Expedition - Named User**5672-VPR ENOVIA Program Management for VPM V5 - Named User**5672-VXB ENOVIA X-BOM for VPM V5 - Named User**5672-ZBD ENOVIA Collaborative Design for Zuken CR-5000 Board

Designer - Named User**5672-ZBP ENOVIA Collaborative Design for Zuken CR-5000 Board

Producer - Named User**5672-ZSD ENOVIA Collaborative Design for Zuken CR-5000 System

Designer - Named User**

** Renamed product

ENOVIA MatrixOne 10.8 System License products


5674-ADT ENOVIA Adaplet Development Kit - Development SystemLicense**

5674-ADV ENOVIA Collaboration Platform Application DevelopmentKit - Development System License**

5674-DTE ENOVIA Collaboration Platform for Development and Test -System License**

5674-FCS ENOVIA File Collaboration Server - System License**5674-JDD ENOVIA X-BOM for JD Edwards World - System License**5674-JDE ENOVIA X-BOM for JD Edwards EnterpriseOne - System

License**5674-MCN ENOVIA Materials Compliance Connect - System License**5674-ORM ENOVIA X-BOM for Oracle Manufacturing - System License**5674-QAM ENOVIA X-BOM for QAD MFG/PRO - System License**5674-SAM ENOVIA X-BOM for SAP - System License**

** Renamed product

Withdrawals: The following configurations are withdrawn from marketing effective April 29,2008:


Program# Program name

5672-DAD MatrixOne Designer Central for AutoCAD - Named User5672-DC4 MatrixOne Designer Central for CATIA V4 - Named User5672-DC5 MatrixOne Designer Central for CATIA V5 - Named User5672-DCE MatrixOne Designer Central for Cadence Allegro PCB Editor

- Named User5672-DCH MatrixOne Designer Central for Cadence Allegro Design

Entry HDL - Named User5672-DCP MatrixOne Designer Central for Cadence Project Manager -

Named User5672-DIV MatrixOne Designer Central for Inventor - Named User5672-DMD MatrixOne Designer Central for Mentor Graphics Design

Manager - Named User5672-DMS MatrixOne Designer Central for Microstation - Named User5672-DPI MatrixOne Designer Central for Pro/I - Named User5672-DPO MatrixOne Designer Central for Pro/E - Named User5672-DSG MatrixOne Designer Central for Solid Edge - Named User5672-DSW MatrixOne Designer Central for SolidWorks - Named User5672-DUG MatrixOne Designer Central for Unigraphics - Named User5672-DVB MatrixOne Designer Central for Expedition (VeriBest) -

Named User5672-DZD MatrixOne Designer Central for Zuken Board Designer -

Named User5672-DZP MatrixOne Designer Central for Zuken Board Producer -

Named User5672-DZS MatrixOne Designer Central for Zuken System Designer -

Named User5672-GSS MatrixOne Global Sourcing Solution - Named User5672-STS MatrixOne Semiconductor Accelerator for Team Collaboration

Solution - Named User

The following products are withdrawn from marketing effective April 29, 2008.

Program# Program name

5672-AEF MatrixOne Application Exchange Framework - Named User5672-BMM MatrixOne Business Metrics Module - Named User5672-PLF MatrixOne Platform - Named User5672-SCD MatrixOne Semiconductor Accelerator - Named User5672-TEA MatrixOne Team Central - Named User5674-PLF MatrixOne Platform - System License

Customization option: Feature number 3444 is used for serial number purposes only; no mediaor documentation will ship with an initial or MES order.

New ENOVIA MatrixOne 10.8 products: 5672-ADI ENOVIA Collaboration for AdobeIllustrator - Named User

Entitlement License Pricingentity Description option metric

S015017 ADI Prod Primary License Lic to Use PLC per UserS015018 ADI Prod Recurring License Basic ALC per UserS015019 ADI Prod Variable Term Lic Basic YLC per User

5672-CPF ENOVIA Collaboration Platform - Named User


S01501N CPF Prod Primary License Lic to Use PLC per UserS01501L CPF Prod Recurring License Basic ALC per UserS01501R CPF Prod Variable Term Lic Basic YLC per User

5672-CPW ENOVIA Collaboration Platform Workgroup Architecture - Named User


S01501W CPW Prod Primary License Lic to Use PLC per UserS015021 CPW Prod Recurring License Basic ALC per UserS01501V CPW Prod Variable Term Lic Basic YLC per User


5672-IMC ENOVIA Collaborative Interference Management - Named User


S01502B IMC Prod Primary License Lic to Use PLC per UserS015024 IMC Prod Recurring License Basic ALC per UserS015028 IMC Prod Variable Term Lic Basic YLC per User

5672-SCC ENOVIA Semiconductor Accelerator for Team Collaboration - Named User


S01502N SCC Prod Primary License Lic to Use PLC per UserS01502H SCC Prod Recurring License Basic ALC per UserS01502G SCC Prod Variable Term Lic Basic YLC per User

5672-SDM ENOVIA Semiconductor Accelerator for Design to Manufacture - Named User


S015031 SDM Prod Primary License Lic to Use PLC per UserS01502V SDM Prod Recurring License Basic ALC per UserS01502Z SDM Prod Variable Term Lic Basic YLC per User

5672-SEP ENOVIA Semiconductor Accelerator for Enterprise Project Management -Named User


S015034 SEP Prod Primary License Lic to Use PLC per UserS015037 SEP Prod Recurring License Basic ALC per UserS015039 SEP Prod Variable Term Lic Basic YLC per User

5672-SIP ENOVIA Semiconductor Accelerator for IP Management - Named User


S01503C SIP Prod Primary License Lic to Use PLC per UserS01503F SIP Prod Recurring License Basic ALC per UserS01503G SIP Prod Variable Term Lic Basic YLC per User

5674-SCH ENOVIA Schema Analyzer - Development System License


S01503N SCH Prod Primary License Lic to Use PLC per UserS01503P SCH Prod Recurring License Basic ALC per UserS01503V SCH Prod Variable Term Lic Basic YLC per User

Optional products: 5672-NL1 ENOVIA NLV Softcopy Collection Kit


S0150KK NL1 Prod Primary License Lic to Use PLC per UserS0150KL NL1 Prod Recurring License Basic ALC per UserS0150KM NL1 Prod Variable Term Lic Basic YLC per User

Basic machine-readable material

Orderable supplies

All products for ENOVIA MatrixOne have orderable supply IDs.

Note: An exception is those few products that have stand-alone supplies. For example, an orderfor 5672-NL1 delivers the optional ENOVIA NLV Softcopy Collection Kit.

For each product ordered, the ShopPLM configurator will add the 5628-EM1 system program


order (SPO) and assign the entitlement entity number for the orderable supply.

Distri-Orderable butionSupply ID Language Medium Description

S0150HJ English CD-ROM ENOVIA Col-Adobe Illustr-NU(5672-ADI)

S0150HK English CD-ROM ENOVIA Col Platform-NU(5672-CPF)

S0150HL English CD-ROM ENOVIA Col Platfm Wrkgoup-NU(5672-CPW)

S0150HM English CD-ROM ENOVIA Col Intrfrnce Mgt-NU(5672-IMC)

S0150HN English CD-ROM ENOVIA Semi Accl-Team Col-NU(5672-SCC)

S0150HP English CD-ROM ENOVIA Semi Accl-Dsg-Mnfctr-NU(5672-SDM)

S0150HR English CD-ROM ENOVIA Semi Accl-Ent PM-NU(5672-SEP)

S0150HS English CD-ROM ENOVIA Semi Accl-IP Mgmt-NU(5672-SIP)

S0150HT English CD-ROM ENOVIA Schema Analyzer-Dev SL(5674-SCH)

The following list contains the Orderable Supply IDs for the renamed products in 10.8.

Distri-Orderable butionSupply ID Language Medium Product ID

S0146T7 English CD-ROM ENO Adaplet Dev Kit-Dev SL (5674-ADT)S0146VL English CD-ROM ENO Aero-Defense Accl-PM-NU (5672-AER)S0146SP English CD-ROM ENO Aero-Dfns Accl-PM Sln-NU (5672-AES)S0146VV English CD-ROM ENO Apparel Accl-Dsg & Dev-NU (5672-APR)S0146T0 English CD-ROM ENO Col Platfm ADK-Dev SL (5674-ADV)S0146SS English CD-ROM ENO Aprl Accl-Dsg-Dev Sln-NU (5672-ARS)S0146VR English CD-ROM ENO Auto Accl-PM Mgt-NU(APQP)(5672-AUT)S0146SR English CD-ROM ENO Auto Accl-PM Mgt Sln-NU (5672-AUS)S0146VH English CD-ROM ENO Col Dsg-AutoCAD Int-NU (5672-AAD)S0146SZ English CD-ROM ENO Adv Srch-Autonomy K2-NU (5672-AK2)S0146VK English CD-ROM ENO Col Dsg-Allegro HDL-NU (5672-CDH)S0146VM English CD-ROM ENO Col Dsg-Allegro PCB-NU (5672-CDP)S0146V7 English CD-ROM ENO Col Dsg-Cadence PM-NU (5672-CDM)S0146V6 English CD-ROM ENO Col Dsg-CATIA V4-NU (5672-CT4)S0146VC English CD-ROM ENO Col Dsg-CATIA V5-NU (5672-CT5)S0146T8 English CD-ROM ENO Col 2D-AutoView Pro-NU (5672-C2D)S0146TJ English CD-ROM ENO Col 3D-AutoView Pro-NU (5672-C3D)S0146TB English CD-ROM ENO XBOM-ClearCase-NU (5672-CLC)S0146TG English CD-ROM ENO XBOM Cost Analytics-NU (5672-CST)S0146VD English CD-ROM ENO Designer Central-NU (5672-DEC)S0146V3 English CD-ROM ENO Dsg Cntrl-Visualizatn-NU (5672-DEV)S0146TD English CD-ROM ENO Engineering Central-NU (5672-ENG)S0146VW English CD-ROM ENO Col Dsg-Mentor Expd-NU (5672-VEB)S0146SG English CD-ROM ENO Glbl Splr Col Sln-NU (5672-GCS)S0146VJ English CD-ROM ENO Col Dsg-Inventor-NU (5672-INV)S0146TR English CD-ROM ENO XBOM-JD Edwards World-SL (5674-JDD)S0146TS English CD-ROM ENO XBOM-JD Edwards Entpl-SL (5674-JDE)S0146TL English CD-ROM ENO Library Central-NU (5672-LIB)S0146V1 English CD-ROM ENO Matls Cmplnc Central-NU (5672-MCC)S0146TZ English CD-ROM ENO Matls Complnc Connect-SL (5674-MCN)S0146SW English CD-ROM ENO Med Dev Accl-Cmpl Sln-NU (5672-MRS)S0146VZ English CD-ROM ENO Med Dev Accl-Reg Cmpl-NU (5672-MED)S0146TC English CD-ROM ENO XBOM Manufacturing-NU (5672-MFG)S0146TK English CD-ROM ENO Col-Microsoft-NU (5672-MSF)S0146V8 English CD-ROM ENO Col Dsg-MicroStatio-NU (5672-MCR)S0146VN English CD-ROM ENO Col Dsg-MentorG DM-NU (5672-MGM)S0146TT English CD-ROM ENO Matls Cmpl Splr-Prtl-NU (5672-MSU)S0146TP English CD-ROM ENO XBOM-Oracle Manufg-SL (5674-ORM)S0146T6 English CD-ROM ENO Col Platfm-Dev & Test-SL (5674-DTE)S0146T3 English CD-ROM ENO File Collabn Server-SL (5674-FCS)S0146V9 English CD-ROM ENO Col Design - Pro-E-NU (5672-PRO)S0146VF English CD-ROM ENO Col Design - Pro-I-NU (5672-PRI)


S0146TW English CD-ROM ENO Product Central-NU (5672-PRD)S0146TV English CD-ROM ENO Program Central-NU (5672-PRG)S0146TN English CD-ROM ENO XBOM-QAD MFGPRO-SL (5674-QAM)S0146TX English CD-ROM ENO XBOM-SAP-SL (5674-SAM)S0146T1 English CD-ROM ENO Semi Accl-Ent PM Sln-NU (5672-SPS)S0146SX English CD-ROM ENO Semi Accl-IP Mgt Sln-NU (5672-SIS)S0146SV English CD-ROM ENO Semi Accl-Dsg-Mfg Sln-NU (5672-SDS)S0146VG English CD-ROM ENO Col Dsg-SolidEdge-NU (5672-SLE)S0146V5 English CD-ROM ENO Col Dsg-SolidWorks-NU (5672-SLW)S0146V0 English CD-ROM ENO Sourcing Central-NU (5672-SRC)S0146TF English CD-ROM ENO Specification Central-NU (5672-SPC)S0146VB English CD-ROM ENO Supplier Central-NU (5672-SUP)S0146V4 English CD-ROM ENO Col Design-UGS NX-NU (5672-UGR)S0146TM English CD-ROM ENO XBOM for VPM V5-NU (5672-VXB)S0146SF English CD-ROM ENO XBOM for VPM V5 Sln-NU (5672-VXS)S0146W0 English CD-ROM ENO PM Mgt-VPM V5 Sln-NU (5672-VPG)S0146V2 English CD-ROM ENO Prog. Mgt for VPM V5-NU (5672-VPR)S0146VT English CD-ROM ENO Col Dsg-Zuken B Dsg-NU (5672-ZBD)S0146VP English CD-ROM ENO Col Dsg-Zuken B Prd-NU (5672-ZBP)S0146VS English CD-ROM ENO Col Dsg-Zuken S Dsg-NU (5672-ZSD)

Optional stand-alone supplies: When using the 5672-NL1 products to order the optionalENOVIA NLV Softcopy Collection Kit, use the following orderable supply ID to effect shipment:

Distri-Orderable butionSupply ID Language Medium Description

S0150K7 English CD-ROM ENOVIA English Documentation(SK4T-3625)

S0150K9 French CD-ROM ENOVIA French Documentation(SK4T-3626)

S0150KC German CD-ROM ENOVIA German Documentation(SK4T-3627)

S0150KF Italian CD-ROM ENOVIA Italian Documentation(SK4T-3628)

S0150KH Japanese CD-ROM ENOVIA Japanese Documentation(SK4T-3629)

Withdrawn orderable supplies: The following orderable supplies are withdrawn effective April29, 2008:

Distri-Orderable butionSupply ID Language medium Description

S0146S0 English CD-ROM M1 Dsgn Cntrl-AutoCAD-NU (5672-DAD)S0146S1 English CD-ROM M1 Dsgn Cntrl-CAT V4-NU (5672-DC4)S0146S2 English CD-ROM M1 Dsgn Cntrl-CAT V5-NU (5672-DC5)S0146S8 English CD-ROM M1 Dsgn Cntrl-CA PCB Edtr-NU (5672-DCE)S0146S9 English CD-ROM M1 Dsgn Cntrl-CA Dsn Ent-NU (5672-DCH)S0146SN English CD-ROM M1 Dsgn Cntrl-Cadence PM-NU (5672-DCP)S0146S3 English CD-ROM M1 Dsgn Cntrl-Inventor-NU (5672-DIV)S0146SJ English CD-ROM M1 Dsgn Cntrl-Mntr Grphcs-NU (5672-DMD)S0146S4 English CD-ROM M1 Dsgn Cntrl-Microstn-NU (5672-DMS)S0146S6 English CD-ROM M1 Dsgn Cntrl-Pro-I-NU (5672-DPI)S0146S5 English CD-ROM M1 Dsgn Cntrl-Pro-E-NU (5672-DPO)S0146S7 English CD-ROM M1 Dsgn Cntrl-Sld Edge-NU (5672-DSG)S0146SC English CD-ROM M1 Dsgn Cntrl-SldWorks-NU (5672-DSW)S0146SB English CD-ROM M1 Dsgn Cntrl-Unigrphcs-NU (5672-DUG)S0146SK English CD-ROM M1 Dsgn Cntrl-Expdn VB-NU (5672-DVB)S0146SM English CD-ROM M1 Dsn Cntrl-Zkn Brd Dsgn-NU (5672-DZD)S0146SH English CD-ROM M1 Dsn Cntrl-Zkn Brd Prdc-NU (5672-DZP)S0146SD English CD-ROM M1 Dsn Cntrl-Zkn Sys Dsgn-NU (5672-DZS)S0146SL English CD-ROM M1 Glbl Sourcing Soln-NU (5672-GSS)S0146ST English CD-ROM M1 Semi Acl-Team Clb Sln-NU (5672-STS)S0146T4 English CD-ROM M1 App Exchg Framework-NU (5672-AEF)S0146TH English CD-ROM M1 Bus Metrics Module-NU (5672-BMM)S0146T5 English CD-ROM M1 Platform-NU (5672-PLF)S0146VX English CD-ROM M1 Semiconductor Accl-NU (5672-SCD)S0146T9 English CD-ROM M1 Team Central-NU (5672-TEA)S0146T2 English CD-ROM M1 Platform-SL (5674-PLF)


Media feature number

Feature DistributionEnvironment number medium

All platforms 3410 CD-ROM

Initial orders: When ordering the first 5672/5674 product for ENOVIA MatrixOne, an order mustalso be placed for the 5628-EM1 SPO. Both the 5672/5674 program order and the SPO must befor the same CPU system type/system number and must have the same scheduled shipmentdate.

Subsequent orders: The SPO must have a feature number for every ENOVIA MatrixOneproduct that is installed or on-order. Therefore, when a product that was not previously installedis ordered, the SPO must be updated.

To update an on-order system: When a license for a new 5672/5674 program is ordered for anon-order system, the 5628-EM1 SPO must be updated to reflect the feature number of thelicensed program desired. Also, for asset registration and billing purposes an order for theindividual licensed program type 5672/5674 is required.

To update an installed system: When a license for a new 5672/5674 program is ordered for aninstalled system, the 5628-EM1 SPO must be updated to reflect the feature number of thelicensed program desired.

Customization options

ENOVIA MatrixOne includes all related product documentation in its CD-ROMs.

Contact your CSO organization for any special handling such as suppression of media orexpediting an order.

Contact IBM Customer Support Operations (CSO) for any special handling, such as suppressionof media or expediting an order.

Unlicensed documentation:

One English softcopy collection kit (SK4T-3625) is automatically included in all shipments.National Language Versions (NLVs) of the softcopy publications in French, German, Italian, andJapanese will be available after general availability at no charge. Customers of record can orderone additional kit per license by ordering:

5672-NL1 ENOVIA NLV Softcopy Collection Kit

and selecting the appropriate orderable supply ID in ShopPLM to choose the language.

By using the following form numbers, additional softcopy collection kits can be ordered throughthe IBM Publication Ordering System:

http://www.elink.ibmlink.ibm.com/public/applications/publications/cgibin/pbi.cgi

Publication

ENOVIA English Documentation (SK4T-3625)ENOVIA French Documentation (SK4T-3626)ENOVIA German Documentation (SK4T-3627)ENOVIA Italian Documentation (SK4T-3628)ENOVIA Japanese Documentation (SK4T-3629)

Licensed documentation: Subsequent updates (technical newsletters or revisions betweenreleases) to the publications shipped with the product will be distributed to the user of record foras long as a license for this software remains in effect. A separate publication order orsubscription is not needed.

Terms and conditions

Agreement: IBM Customer Agreement




Designated machine: Not required

Variable charges apply: No

Location license applies: No

Use limitation applies: Additional licenses must be obtained to extend use levels.

Supplemental terms

The following provisions are in addition to the terms and conditions in the IBM CustomerAgreement or any equivalent agreement executed by you and IBM (the "agreement"). You maynot use the programs if you do not have a valid agreement in place with IBM or if you do notaccept these Supplemental Terms and Conditions. Any capitalized terms that are not definedherein are defined in the agreement.

1. Definitions

These definitions are in addition to those in the agreement.

The term "Authorized Remote User" shall mean an individual Named User of an entityconducting business with you remotely through the Internet, such as a supplier or customer.

The term "Named User(s)" means an individual(s) authorized by you with a unique usernameand password to use the IBM ENOVIA MatrixOne Programs and includes Authorized RemoteUsers, provided that all Named Users comply with the terms of the agreement andsupplemental terms and conditions. For the purpose of clarification, (i) a Named User shallnever be interpreted to mean a corporation, partnership, non-incorporated entity, or any othertype of organization or group of individuals as a whole, and (ii) Named Users shall not shareor use the same username and password.

The term "System License" means a license to use certain IBM ENOVIA MatrixOneLicensed Program(s) on a Designated Machine. A minimum number of one Named Userlicense of identified prerequisite IBM ENOVIA MatrixOne Programs is required in order toaccess a System License.

2. Use of IBM ENOVIA MatrixOne Programs by Named Users and Authorized RemoteUsers

a) You may replace Named Users as necessary to reflect permanent personnel changes,provided that the number of individuals authorized to use the IBM ENOVIA MatrixOneProgram(s) does not exceed the maximum number of Named User authorizations you havepurchased from IBM.

b) Named User licenses to the IBM ENOVIA MatrixOne Programs to which theseSupplemental Terms and Conditions apply are granted for use worldwide and may be usedonly in connection with a specific Designated Machine.

c) Named Users that are Authorized Remote Users may access the applicable DesignatedMachine remotely via the Internet for the sole purpose of enabling the Authorized RemoteUser to conduct business with you, provided that any such Authorized Remote User shall belimited to use of the IBM ENOVIA MatrixOne Programs (a) solely as configured and deployedby you and (b) solely in connection with their performance of services for and on behalf of you,and not for such Authorized Named User's own or another's account or for the purpose ofhosting, modifying, or otherwise using or maintaining the IBM ENOVIA MatrixOne Programs.You agree that you are responsible for ensuring that any use of the IBM ENOVIA MatrixOnePrograms by all Authorized Remote Users shall be in compliance with the terms andconditions of the agreement and these Supplemental Terms and Conditions, and any breachby Authorized Remote Users of the terms of the agreement and these supplemental termsand Conditions shall be deemed a breach by you.

3. Compliance Verification

For purposes of this section, "Program Terms" means terms applicable to IBM ENOVIAMatrixOne Programs in the agreement and any applicable Transaction Documents,Attachments and Specifications (including this one). Upon reasonable notice, IBM may verifyyour compliance with Program Terms at all site(s) and for all environments in which you use orinstall the IBM ENOVIA MatrixOne Programs (whether for testing or productive use orotherwise). Such verification will be conducted during your normal business hours and in a


manner that minimizes disruption to your business. IBM may use an independent auditor toassist with such verification, provided IBM has a written confidentiality agreement in place withsuch auditor.

As reasonably necessary to verify your use and installation of the IBM ENOVIA MatrixOnePrograms and your compliance with the Program Terms, you agree to: create, retain, andprovide to IBM and its auditors written and other records, system tools outputs, and otherelectronic or hardcopy system information, including information regarding the systemconfigurations on which the IBM ENOVIA MatrixOne Programs operate; and permit IBM andits auditors to be present and observe while you accesses machines to provide such records,outputs and other system information.

IBM will notify you in writing if any such verification indicates that you are not in compliancewith the Program Terms. You agree to promptly pay any additional charges and otherliabilities you become obligated to pay based on its use and deployment of IBM ENOVIAMatrixOne Programs or your failure to comply with the Program Terms at any time during theperiod such IBM ENOVIA MatrixOne Programs are licensed to you.

The rights and obligations in this section remain in effect during the period such IBM ENOVIAMatrixOne Programs are licensed to you and for two years thereafter. This section applies toall IBM ENOVIA MatrixOne Programs licensed within your Enterprise, including any licensedunder separate Attachments and Transaction Documents, notwithstanding any contrary auditprovisions that may be contained in them.

4. Excluded Components

The provisions of this paragraph do not apply to the extent they are held to be invalid orunenforceable under the law that governs this license. The components listed below are"Excluded Components." Notwithstanding any of the terms in the agreement or any otheragreement You may have with IBM:

(a) the third party suppliers of such Excluded Components ("Suppliers") provide thecomponents WITHOUT WARRANTIES OF ANY KIND and, such Suppliers DISCLAIM ANYAND ALL EXPRESS AND IMPLIED WARRANTIES AND CONDITIONS INCLUDING, BUTNOT LIMITED TO, THE WARRANTY OF TITLE, NON-INFRINGEMENT ORINTERFERENCE AND THE IMPLIED WARRANTIES AND CONDITIONS OFMERCHANTABILITY AND FITNESS FOR A PARTICULAR PURPOSE, WITH RESPECTTO THE EXCLUDED COMPONENTS;

(b) in no event are the Suppliers liable for any direct, indirect, incidental, special, exemplary,punitive or consequential damages, including but not limited to lost data, lost savings, andlost profits, with respect to the Excluded Components; and,

(c) IBM and the Suppliers are not liable to You, and will not defend, indemnify, or hold Youharmless for any claims arising from or related to the Excluded Components.

The following are Excluded Components:

Getline1993 version

Krypto

OpenLDAP

OpenSSL

Sun RPC

Tcl

ftp client

JavaMail

JRegEx

Cryptix

dib2jpeg.lib

jpeg.lib

Java Service Wrapper

libxml2

libxml2 (windows)


expat

libCurl

Python

JavaMail

JavaBeans Activation Framework

JAXP

JSSE

ImageEncoder and GifEndcoder

dsofile

cximage.lib

Nano XML

ThumbExtract

Ant

Apache Servlet-API

Axis

JDOM

Xalan

Xerces

Jakarta POI

Xerces2

Log4J

commons-math-1.1.jar

Axis

HttpClient

Jakarta POI

Castor

aprUtil

SSLUtils

Xml-Apis.jar

Jakarta/Commons/Sandbox/Compress

Tomcat

Notices and important information that IBM is required to provide to you with respect to theExcluded Components, may be found in product documentation (such as Installation Guides,Administrator's Guides, and User Guides) on the product media.

Your use of the Excluded Components is governed by the terms of the agreement and not byany terms that may be contained in the NOTICES file. The terms contained in the agreement areoffered by IBM and not by any other party. Future program updates or fix packs may containadditional Excluded Components. Such additional Excluded Components, and related noticesand information, if any, will be listed in another file that accompanies the program update or fixpack.

Volume orders: Contact your IBM representative.

Warranty applies: Yes

Licensed program materials availability

• Restricted Materials of IBM: None


• Non-Restricted Source Materials: None

• Object Code Only (OCO): All

Program services: Program Services offer a method of reporting code-related problems forENOVIA MatrixOne licensed software products. Program Services are available electronicallyusing the problem submission process at the PLM Technical Support web site at:


Note: In order to use this facility, you must use an IBM ID which has associated to it the licensedIBM customer number under which the product was purchased. If you have not yet obtained anIBM ID, visit

http://www.ibm.com/account/profile/

If you have not yet associated the licensed IBM customer number to your IBM ID, you will beprompted to do so when accessing the problem submission facility.

When using Program Services, the problem report is submitted via the PLM Technical Supportweb site; all subsequent communications will be via e-mail. The response time for these problemreports, regardless of the severity, will be within two business days. All communications must bein English.

Preventive Service is delivered through the next release of ENOVIA MatrixOne products. Thenew release also includes corrections to problems, depending on the time of their submissionand their severity.

During the Program Services period, Corrective Service for ENOVIA MatrixOne releases isdelivered through service packs. A service pack includes corrections for Blocking problems inproduction systems reported on this release and all corrections available for all components atthe time it is built. Service Packs are provided at the same time for all platforms currentlysupported.

Customers may request a correction for Blocking Problems. A Blocking Problem is defined as:

• A problem that stops production: The customer is currently using the level for which a fix isrequested in a production environment.

• A problem that prevents migration: The customer must provide the migration plan.

• A problem that halts testing of a given level: A fix will allow customer to continue the testing.

• Installation problem: A problem that prevents the customer from installing or using the product.

• Regression: Problems reported as regressions may be due to an operation that was beingperformed erroneously or created incorrect data with a previous release and the currentrelease no longer permits these operations. Therefore, a problem reported as a regressionmust be evaluated.

Program Services will be provided for this release of ENOVIA MatrixOne products until August24, 2009. Critical situations will be supported until August 24, 2010.

For a list of all currently supported releases of CATIA, ENOVIA VPLM, ENOVIA SmarTeam, andENOVIA MatrixOne products visit


At the bottom of the page, select "End of support dates" under Plan, Product life cycle.

IBM operational support services - SupportLine: No

Other support: PLM Support Centers

Prices

For prices, contact your IBM representative.

Program upgrade charge:



http://www.ibm.com/account/profile/


Use level charge: Charges for this program are based on usage levels. When a customerupgrades to a higher level of usage, a usage upgrade charge will apply, equal to the differencebetween the charge for the current level of usage and the higher level of usage.

IBM Global Financing

IBM Global Financing offers competitive financing to credit-qualified customers to assist them inacquiring IT solutions. Offerings include financing for IT acquisition, including hardware,software, and services, from both IBM and other manufacturers or vendors. Offerings (for allcustomer segments: small, medium, and large enterprise), rates, terms, and availability can varyby country. Contact your local IBM Global Financing organization or visit

http://www.ibm.com/financing

IBM Global Financing offerings are provided through IBM Credit LLC in the United States, andother IBM subsidiaries and divisions worldwide to qualified commercial and governmentcustomers. Rates are based on a customer's credit rating, financing terms, offering type,equipment type, and options, and may vary by country. Other restrictions may apply. Rates andofferings are subject to change, extension, or withdrawal without notice.

Trademarks

Express Server and IBMLink are trademarks of International Business Machines Corporation in the UnitedStates or other countries or both.

DB2, AIX, SP2, WebSphere, ClearCase, and Rational are registered trademarks of International BusinessMachines Corporation in the United States or other countries or both.

Windows, Windows Vista, and Microsoft are registered trademarks of Microsoft Corporation.

Java is a trademark of Sun Microsystems, Inc.

UNIX is a registered trademark of the Open Company in the United States and other countries.

Linux is a trademark of Linus Torvalds in the United States, other countries or both.

Other company, product, and service names may be trademarks or service marks of others.

This announcement is provided for your information only. For additional information, contact your IBM representative, call800-IBM-4YOU, or visit the IBM home page at: http://www.ibm.com


http://www.ibm.com/financing

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