AAO ALUMINUM POROUS

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    Applied Physics A

    Materials Science & Processing

    ISSN 0947-8396

    Appl. Phys. A

    DOI 10.1007/s00339-014-8242-5

    Controllable fabrication of highly orderedthin AAO template on Si substrate for

    electrodeposition of nanostructures

    Khaled M. Chahrour, Naser M. Ahmed,

    M. R. Hashim, Nezar G. Elfadill &

    M. A. Qaeed

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    13

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    Controllable fabrication of highly ordered thin AAO templateon Si substrate for electrodeposition of nanostructures

    Khaled M. Chahrour Naser M. Ahmed

    M. R. Hashim Nezar G. Elfadill M. A. Qaeed

    Received: 30 November 2013 / Accepted: 8 January 2014

    Springer-Verlag Berlin Heidelberg 2014

    Abstract In this work, simple fabrication of hexagonally

    highly ordered porous anodic aluminum oxide (AAO) of Althin film (1 lm) on Si substrate is described using two-step

    anodization method for electrochemical synthesis of

    nanostructures. In this method, the templates were prepared

    under the controllable conditions of the parameters, which

    give rise to the possibility of highly ordered nanopore

    arrays with a well aspect ratio. Pore widening was then

    fulfilled in 5 wt% phosphoric acid solution at 25 C. The

    pore diameter and spacing are proportional to the applied

    voltage, which is due to the mechanical stress associated

    with the volume expansion of the aluminum during the

    anodization according to the mechanical stress model.

    Pore-widening solution adjusted the pore diameter and

    thinned the AAO barrier layer at room temperature under

    the control of etching time. As an application, Cu nanorods

    arrays embedded in anodic alumina (AAO) template were

    fabricated by dc electrodeposition. The characterization of

    the AAO templates and the Cu nanorods produced was

    made by X-ray diffraction, field emission scanning

    microscope, energy dispersive X-ray spectroscopy and

    atomic force microscope (AFM). The images of AFM

    show that porous AAO template under constant voltage is

    40 V which presents the optimum ordering.

    1 Introduction

    Template technique is one of the most successful approa-

    ches for obtaining size-controllable nanomaterials [1].

    Recently, porous anodic aluminum oxide (AAO) templates

    have received considerable attention in synthetic nano-

    structure materials due to particular characters such as

    controllable pore diameter and periodicity [2]. The porous

    AAO template fabrication process and mechanisms of pore

    formation have been studied [3, 4]. Using porous AAO

    templates for nanostructure deposition needs no costly

    nanolithography. There are two major kinds of porous AAO

    templates, the first-type of porous AAO template is grown

    on a bulk pure aluminum foil [5], while the second-type is

    grown on a substrate such as silicon [3]. The second-type of

    the template is preferable due to fact that this silicon sub-

    strate usually functions as an electrode as well as a

    mechanical support [6]. Most of the developed methods for

    producing porous AAO templates generally yield highly

    ordered arrays on bulk Al foil [7]. Until now, the fabrication

    of highly ordered thin films of porous AAO on Si substrate

    is difficult to be formed mainly due to the complicated

    surface states (roughness and crystallite sizes) and non-

    uniformity of the deposited Al film [8,9] and still remains a

    major challenge from the scientific and technological point

    of review [10]. In spite of the wide range of promising

    applications of the AAO templates, the biggest problem

    remains is the barrier layer formed at the bottom of the AAO

    pores, which prevents direct physical and electrical contact

    to the substrate [11]. To remove the barrier layer, various

    techniques such as pore widening, cathodic polarization,

    voltage drop, plasma assisted etching, etc. were employed

    [1214]. However, there are some challenges posed by the

    thin film AAO templates, including achieving highly-

    ordered AAO templates with open-through pore structure.

    K. M. Chahrour (&) N. M. Ahmed M. R. Hashim

    N. G. Elfadill M. A. Qaeed

    Nano-Optoelectronics Research and Technology Laboratory,

    School of Physics, Universiti Sains Malaysia, 11800 Penang,

    Malaysia

    e-mail: [email protected]

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    Appl. Phys. A

    DOI 10.1007/s00339-014-8242-5

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    In this work, we show that highly ordered thin porous

    AAO templates can be grown on Si substrate under con-

    trollable condition sets of anodizing process with thin Al

    films using two-step anodizing process [15], leading to

    perfect hexagonal pore structure, since the ordering of the

    pore arrangement of porous AAO templates control the

    regularity of further nanostructures fabricated using AAO

    templates as host material [16]. This work focused on theinfluence of voltage and pore-widening time on the struc-

    ture, order of thin porous AAO template. The advantages

    of our work over the past studies are that we used a simple

    pore-widening solution for adjusting the pore diameter and

    thinning the AAO barrier layer at room temperature under

    control of etching time for only few minutes to prepare

    nanostructures scaffolds with desirable pore diameters that

    we need.

    2 Experimental method

    P-type (100) Si substrate with area of (1.5 cm 9 1.5 cm)

    was cleaned with (RCA) method prior to deposit 20 nm of

    Ti film using RF sputtering, subsequently an Al (purity

    99.99 %) was evaporated by e-beam on Ti film with

    thickness of 1 lm. All samples were annealed at 500 C

    for 2 h in a conventional furnace under nitrogen ambient.

    Our experimental results show that the use of a Ti adhesion

    layer prevented the pealing-off the Al film from the Si

    wafer during anodization. The anodizing process was per-

    formed in a special design electrochemical cell using a

    platinum rod as a cathode. The electric contact was made at

    the backside of the Si substrate. The samples were anod-

    ized in acidic aqueous solution of 0.3 M oxalic acid under

    different voltages for a certain time. After the finishing ofthe first anodizing, an aluminum oxide layer was removed

    by wet etching in aqueous solution of 6 wt% phosphoric

    acid and 1.8 wt% chromic acid at 60 C for 30 min. The

    second anodizing was carried out with the same control-

    lable conditions of the first anodizing until all of the

    residual aluminum was oxidized. Pore widening is con-

    trolled by immersing the AAO template into 5 wt%

    phosphoric acid solution at 25 C for different times. The

    electrochemical cell was cooled with circulating water bath

    system to ensure a constant temperature below 20 C.

    During anodizing process, the electrolyte was vigorously

    stirred. Some as-synthesized AAO templates are furtherannealed at 800 C for 5 h in atmosphere.

    As an application, copper nanorods were deposited po-

    tentiostatically, with AAO template serving as working

    electrode, platinum rod and Ag/AgCl(sat)as the counter and

    reference electrodes, respectively, using a EDAQ Model

    potentiostat. The electrolyte was 0.45 M of CuSO2

    Fig. 1 aFESEM images show top view and a cross-sectional view of

    the AAO templates. AAO templates were prepared under parameter

    conditions; time of first anodization is 10 min and anodizing voltage

    40, 45, 50 V, respectively. Pore-widening time is 20 min, b curve

    correlating mean pore diameter with voltage, andc AFM images (i )

    AAO prepared under 50 V and (ii) AAO prepared under 40 V

    K. M. Chahrour et al.

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    dissolved in 3 M lactic acid. The solutions PH was

    adjusted to 9 using sodium hydroxide. The electrodepos-

    ition was performed at an applied potential of -1 V for

    5 min. The temperature was maintained at 60 C, with

    constant stirring throughout electrodeposition. Upon com-

    pletion, the AAO template was rinsed by deionized water

    and dried. The surface morphology and structure of the

    fabricated AAO templates and the deposited Cu nanorodswere studied using FESEM, EDX, AFM and XRD.

    3 Results and discussion

    The morphology of the fabricated AAO templates was

    characterized by FESEM and AFM images. Figure1a

    shows typical top view and a cross-sectional view of the

    AAO templates under 40, 45 and 50 V, respectively. The

    results show distinctly that an ordered honeycomb structure

    with uniformity in pore diameter and spacing can be fab-

    ricated with two-step anodization under controllable con-ditions; also Fig.1a illustrates that the pore diameter and

    interpore distance increase with increasing voltage. The

    mean of pore diameter is 65 nm and mean of interpore

    distance is 110 nm for AAO template prepared under 40 V.

    AAO template prepared under 45 V has a mean pore size of

    70 nm and a mean interpore distance of 115 nm, while

    AAO template prepared under 50 V has a mean pore size of

    85 nm and a mean interpore distance of 128 nm. A curve

    correlating mean pore diameter with anodizing voltage

    described in Fig.1b illustrates that the mean pore diameter

    is increased with increasing the voltage. In addition, AAOsample prepared under lower voltage is more regular as

    shown in AFM images (Fig. 1c). The mechanism of self-

    organization is not fully understood, even though it can be

    explained by the mechanical stress model proposed by

    Jessensky et al. [4]. Pores are first formed at certain micro-

    rough region where the current density is concentrated on

    after the formation of steady oxide layer and then the pores

    grow vertically to surface with equilibrium of field-

    enhanced oxide dissolution at the oxide/electrolyte interface

    and oxide growth at the metal/oxide interface, and the

    horizontal growth is performed simultaneously. In this

    process, the compressive stress between the pores which areassociated with the volume expansion of the aluminum

    during anodization impulses the structural adjustment to

    form honeycomb like pore arrays. With the enhancement of

    Fig. 2 FESEM images show top view of the AAO templates. AAO

    templates were prepared under parameter conditions; time of first

    anodization is 10 min and anodizing voltage 40 V. Time of pore

    widening t= 10, t= 15 and t= 20 min, respectively. Curve corre-

    lating mean pore diameter with pore-widening time

    Controllable fabrication of highly ordered thin AAO template on Si substrate

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    anodizing voltage, the horizontal growth of the pores

    increases leading to the enlargement of the pore diameter

    and spacing. At the same time, the arrangement among the

    pores cannot keep up with the growth velocity of AAO and

    the ordering of this structure might decrease.

    Although AAO template prepared after two-step

    anodization possesses controllable pore diameter and

    periodicity, further pore adjustment can be actualized byexposure to phosphoric acid, which is called pore wid-

    ening. The FESEM images of the AAO templates were

    prepared under 40 V after pore widening for 10, 15 and

    20 min at 25 C as shown in Fig. 2a. The pore diameter

    increases, while the pore spacing almost keeps unchanged.Fig. 3 XRD spectra of AAO templatea with annealing andbwithout

    annealing

    Fig. 4 a, b FESEM image shows the deposition of Cu inside of AAO template and EDX spectra. c, d FESEM image shows a cross-sectional

    view of Cu nanorods perpendicular to the Si substrate after removal of AAO template and EDX spectra, respectively

    K. M. Chahrour et al.

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    A curve correlating mean pore diameter with widening

    time described in Fig.2b illustrates that the mean pore

    diameter is monotonously increased with increasing the

    pore-widening time. The increase of pore diameter after

    the thinning of the outer and inner surface of AAO tem-

    plate might be due to the wet etching effect of phosphoricacid. This provides a convenient route to prepare AAO

    template of any desired pore diameter that we need. Then,

    any desired nanostructure diameter can be grown in its

    pore. Figure3 shows XRD spectra of AAO template after

    annealing, the reflection peak of (222) corresponding to

    the Al2O3 phase appear [17], which implies that the AAO

    transforms from amorphous to crystalline after annealing

    at 800 C.

    With the aid of AAO template and electrodeposition

    process, highly ordered and vertical arrays of Cu nanorods

    can be prepared. Figure4a, b shows the plane view for

    AAO template on a Si substrate after deposition of Cu,almost all the nanopores were filled by Cu and confirmed

    with the EDX spectra. The lengths of Cu nanorods grown

    inside the AAO template were longer than the depth of

    AAO template whereby all the nanorods showed sign of

    overgrowth. Figure4c shows the Cu nanorods remained

    vertically to the Si substrate and could be observed clearly.

    It is worth noting that the heights of the nanorods were

    uniform and remained separated from each other after the

    removal of the AAO template. The length of the nanorods

    was 1.25 lm and the approximate diameter was 50 nm.

    Note that some of the Cu nanorods near the front edge were

    broken during the splitting process for the preparation ofcross-sectional FESEM samples. Figure4d shows EDX

    spectra that confirm the compositions of the nanorods on Si

    substrate after the removal of the AAO template. Figure5

    shows the X-ray diffraction patterns of copper nanorods

    embedded in AAO template. The nanorods were poly-

    crystalline with cubic structure indicated by the presence of

    two prominent peaks close to 2h angles of 43.41 and

    50.60, corresponding to Cu (111) and Cu (200) diffrac-

    tions, respectively.

    4 Conclusions

    Highly ordered pore arrays in AAO templates with uniform

    pore size and vertically aligned nanotubes with well aspect

    ratio were successfully fabricated by anodization of thin Al

    film on Si wafer. Anodizing voltage and time of pore

    widening are explored in our experimental conditions.

    FESEM analysis show that the pore diameter depends onboth anodizing voltage and time of pore widening, also the

    AAO template prepared under 40 V present the optimum

    ordering as shown in the AFM images. The relation

    between the ordering of the pore arrays and anodizing

    voltage is explained by a growthdissolution model. A

    simple wet etching process is used for thinning the bottom

    barrier layer of AAO template and widening of any desired

    pore diameter that we need under a control of etching time.

    FESEM analysis show that highly orderly self-aligned Cu

    nanorods have been prepared on AAO template/Si sub-

    strate using electrochemical process. Finally, stirring and

    maintaining the electrolyte below 20 C are critical steps inobtaining ordered pore arrays.

    Acknowledgments We gratefully acknowledge the support of the

    School of Physics, University Saince Malaysia under short term Grant

    No. 304/PFIZIK/6312076.

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    Fig. 5 XRD spectra of copper nanorods embedded in AAO template

    Controllable fabrication of highly ordered thin AAO template on Si substrate

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